Montana - EE - 207

Montana - EE - 207

EE207 Circuits II Lab #9 "Circuit Analysis using the Laplace Transform"ObjectiveThe objective of this lab is to use the Laplace Transform to help us analyze circuits. We will use PSPICE and Matlab to verify our hand calculations. We will take a 2n

Montana - EE - 207

Montana - EE - 207

Montana - EE - 207

Montana - EE - 207

Montana - EE - 207

EE 207 Lab Kit Item Value Qty Resistor 10 Resistor 1K Resistor 10K Resistor 100K Resistor 1M Capacitor, Poly .027uF P4587-ND Capacitor electrolytic 2.2uF P5175-ND inductor 1 mH 434-1120-103k inductor 10 mH 434-1120-104k inductor 82 mH 43LJ382 op-amp

Montana - EE - 207

EE317 Lab Notebook Grade Criteria Evaluation Key: 2 Consistent performance 1 Occasional performance, needs some work 0 Little evidence of attribute 1. The notebook provides complete and accurate description of laboratory activities, with drawings and

Montana - EE - 505

EE505 MEMS Lab: Fab Sequence1Blank 4 inch double side polished n-type p yp silicon wafer with resistivity of 1-30 -cmMontana State UniversityTjKReading: 28-44Chp 2-#021EE505 MEMS Lab: Fab Sequence2Oxide grown for masking layer g g y

Montana - EE - 505

EE505 MEMS Sensors and Actuators Lumped Element Modeling Stress Effects Fabrication process affect mechanical structuresMontana State UniversityTjKReading: 48-95Chp 3-#081Sum of the Forces F = 0 Acceleration p g Damping Restor

Montana - EE - 505

ANSYS Tutorial: Capacitance (GUI Method)Todd Kaiser Montana State University EE505 MEMSCapacitance Modeling Method Model Dielectric and Mesh Select nodes on surface of each conductor Group them into node components and name: cond# The last con

Montana - EE - 505

January 22, 2007ANSYS 101Introduction to ANSYSBrian Peterson EE 505 MEMS Sensors and ActuatorsPresentation Outline ANSYS Tutorial Objective Background Information Overview of Finite Element Analysis (FEA) Analysis Breakdown (Procedural Ov

Montana - EE - 505

EE505 MEMS Sensors and Actuators Electrothermal Transduction Electrothermal Actuation Resistive Sensing gMontana State UniversityTjKReading: 153-200Chp 5-#121Electrothermal Actuation Thermal expansion via Joule heating Applied curren

Montana - EE - 505

EE505 MEMS Sensors and Actuators Piezoelectric Transduction Actuation Sensing gMontana State UniversityTjKReading: 245-273Chp 7-#141Piezoelectricity Piezoelectricity is a coupling between internal dielectric polarization in a material

Montana - EE - 505

EE505 MEMS Sensors and Actuators Piezoelectric Transduction Actuation Model and Sensing gRef: Senturia Chapter 21Montana State UniversityTjKReading: 245-273Chp 7-#151Tuning Fork Rate Sensor Etched from a single-crystal Quartz substr

Montana - EE - 505

EE505 MEMS Sensors and Actuators Magnetic Field Transducers Hall effect Magnetic Actuation g Magnetostrictive Electrodynamic actuation Electromagnetic actuationMontana State UniversityTjKReading: 279-304Chp 8-#161Forces and Currents

Montana - EE - 505

EE505 MEMS Sensors and Actuators Mechanical Transducers Inertial Sensors Accelerometer Gyroscope Pressure Sensors Force Sensors Flow Sensors Converting a mechanical motion into an electrical signalMontana State University-#171Inertial

Montana - EE - 505

EE505 MEMS Sensors and Actuators Mechanical Transducers Inertial Sensors Accelerometer Gyroscope Pressure Sensors Force Sensors Flow Sensors Converting a mechanical motion into an electrical signalMontana State University-#181Montana S

Montana - EE - 505

EE505 MEMS Sensors and Actuators Mechanical Transducers Inertial Sensors Accelerometer Gyroscope Pressure Sensors Microphones Force Sensors Flow Sensors Converting a mechanical motion into an electrical signalMontana State University TjK Re

Montana - EE - 505

EE505 MEMS Sensors and Actuators Mechanical Transducers Inertial Sensors Accelerometer Gyroscope Pressure Sensors Microphones Force Sensors Flow SensorsConverting a mechanical motion into an electrical signalMontana State UniversityTjKR

Montana - EE - 505

EE505 MEMS Sensors and Actuators Optical MEMS Micro-Opto-Electro-Mechanical Systems MOEMS Electrostatic Projection DisplaysConverting a mechanical motion into an electrical signalMontana State UniversityTjKReading pp: 268-275-#211Ele

Montana - EE - 505

EE505 MEMS Sensors and Actuators Optical MEMS Micro-Opto-Electro-Mechanical Systems MOEMS Electrostatic Projection Displays Modeling Optical TransducersSome slides were adapted from O. Brandt, Ga. Tech.Montana State UniversityTjKReading

Montana - EE - 505

EE505 MEMS Sensors and Actuators Chemical/Biological Transducers Mechanical Sensors Thermal Sensors Optical Sensors Electrochemical SensorsSome slides were adapted from O. Brandt, Ga. Tech.Montana State UniversityTjKReading pp:-#231B

Montana - EE - 505

EE505 MEMS Sensors and Actuators Microfluidic Systems Flow Sensors Flow Channels Mixers Valves Pumps Filters Integrated Fluidic Systems (Lab on a chip)Montana State UniversityTjKReading pp: 422-448-#241Issues for MicrofluidicsIss

Montana - EE - 505

EE505 MEMS Sensors and Actuators RF MEMS RF MEMS switches and relays MEMS inductors and variable capacitors RF micromechanical resonators and filters Phase shifters Micromachined transmission lines Micromachined antennas Packaging Reference

Montana - EE - 505

EE505 MEMS Sensors and Actuators Summary Design Cycle References: Senturia: Microsystem DesignMontana State UniversityTjK-#261The MEMS Design Cycle Paramount in MEMS design are creative thinking to come up with new product ideas with m

Montana - EE - 505

MEMS LAB MANUAL2007A complete description of the fabrication sequence for piezoresistive MEMS sensors. This manual was designed for use with the Montana Microfabrication Facility at MSU.Special Thanks to: Andy Lingley Bra d Piers on Phil Hi mme

Montana - EE - 407

BoronPlusHigh Purity Planar DopantBoronPlusDiffusion Sources:Provide pure boron depositions. Impurity analyses of doped silicon wafers show depositions of high purity are achieved.Produce uniform sheet resistivities. Uniformities typical

Montana - EE - 407

CMOS LAB MANUAL 2009 CMOS LAB MANUAL This manual was designed for use with the Montana Microfabrication Facility at MSU. The intention of the manual is to provide lab users and MSU students with a complete descript

Montana - EE - 407

EE407 Introduction to MicrofabricationPhysical Vapor Deposition (PVD) Chapter 6 Pages: 129-136Montana State UniversityTjKReading: 129-136Chp 6-#191Thin Film Deposition Physical Vapor Deposition (PVD) Evaporation p Resistive e-beam I

Montana - EE - 407

EE407 Introduction to MicrofabricationChemical Vapor Deposition Chapter 6 Pages: 136-149Montana State UniversityTjKReading: 136-149Chp 6-#201Thin Film Deposition Physical Vapor Deposition (PVD) Chemical Vapor Deposition (CVD) Pl Plasm

Montana - EE - 407

EE407 Introduction to MicrofabricationPackagingMontana State UniversityTjKReading:177-198Chp -8#231PackagingMontana State UniversityTjKReading:177-198Chp -8#2321Wafer Mounting Backside prep Thinning Metal Deposition p

Montana - EE - 407

EE407 Introduction to MicrofabricationSummary of Test ResultsMontana State UniversityTjKReading:Chp -#251Resistor Test SetupMontana State UniversityTjKReading:Chp -#2521Resistor Test resultsMontana State UniversityTjK

Montana - EE - 407

PhosPlusHigh-Purity Planar Dopant SourcesPhosPlusDiffusion Sources:Produce pure depositions. The use of high-purity raw materials results in high-purity doping of single crystal or polysilicon wafers.Give uniform sheet resistivities. U

Montana - EE - 407

2007Author: Matthew LeoneSpecial Thanks: Todd KaiserMODU-LAB PVDOPERATIONS MANUALThis document is intended to provide users with a complete and thorough set of instructions for the operation and use of the MODU-LAB thermal evaporation PVD syste

Montana - EE - 407

RM3-AR Test Unit InstructionsThe RM3-AR is a combined constant current source and digital voltmeter. It has been designed for use in making resistivity measurements in combination with four point probe equipment. The unit supplies a constant current

Montana - EE - 409

8/28/2008EE409 Material Science Todd J. Kaiser Lecture 01 Atomic Structure and Periodic TableElectronic Materials Electronic Materials are what you find inside the i id th components making up t ki electronic products. Some can be easily cha

Montana - EE - 409

9/4/2008EE409 Material Science Todd J. Kaiser Lecture 02 Bonding and Types of Solids Material MechanicsroMoleculeBondingr=Separated atoms+Attraction+Potential Ener rgy, E(r)R RepulsionFA = Attractive force FN = Net force roInte

Montana - EE - 409

9/4/2008EE409 Material Science Todd J. Kaiser Lecture 03 Kinetic Molecular TheoryKinetic Molecular Theory Demo: Blow up a ballon What has changed? What has changed? Pressure inside balloon has increased Volume inside balloon has increa

Montana - EE - 409

9/9/2008EE409 Material Science Todd J. Kaiser Lecture 04 Thermal Processes pp: 4049Questions What is heat? Heat is the internal energy of a solid which is stored as atom vibration. ib i What is heat flow? Heat flow represents the transfe

Montana - EE - 409

9/29/2008EE409 Material Science Todd J. Kaiser Lecture 12 Semiconductors pp: 373387Silicon is the most important semiconductor in today's electronics|SOURCE: Courtesy of IBM19/29/2008200 mm and 300 mm Si wafers.|SOURCE: Courtesy of M

Montana - EE - 409

10/20/2008EE409 Material Science Todd J. Kaiser Lecture 17 Chapter 6 Semiconductor Devices pn Junctions pp: 4754931Semiconductor SummaryPoint form of Ohm's Law: Relationship between conductivity and resistivity:N ir r J = E=1Co

Montana - EE - 409

10/20/2008EE409 Material Science Todd J. Kaiser Lecture 18 Chapter 6 Semiconductor Devices pn Junctions Band Diagram pp: 4945061pn Junctions in nonequilibriumVAp + + +nOhmic contacts Ohmic contactsApply a potential to the pn

Montana - EE - 409

10/23/2008EE409 MaterialScience ToddJ.Kaiser Lecture20 Chapter6SemiconductorDevices JunctionFieldEffectTransistor(JFET) pp:5225321Howtomodifysemiconductorparameters (Engineer&Design) Dopinginsertatomswithextraelectronsormissing electrons O

Montana - EE - 409

10/24/2008EE409 Material Science Todd J. Kaiser Lecture 21 Chapter 6 Semiconductor Devices MetalOxideSemiconductor Field Effect Transistor (MOSFET) pp: 5325431MetalInsulatorSemiconductor (MIS) MetalOxideSilicon (MOS) CapacitorVG MOSE0

Montana - EE - 409

11/3/2008EE409 Material Science Todd J. Kaiser Lecture 24 Review Semiconductors and Devices Ch 4, 5 & 61Review Point form of Ohm's Law J = E Conductivity function of electron concentration and = q(n n + p p ) = 1 l t t ti d mobility

Montana - EE - 409

Diode Equations: Built-in Voltage:EE409TjKaiserVbi =kT N A N D ln q ni2 N A p - side doping N D n - side dopingDepletion Width: 2e e W x p + xn = r 0 q 2e e xn = r 0 q 2e e xp = r 0 q 2e e W = r 0 q NA + ND 2 N N

Montana - EE - 409

Semiconductor Physics: J=sE s = 1/rEE409TjKaiserpoint form of Ohms Law (V=IR) Relationship between resistivity and conductances = q (nm n + pm p )Drift Current: Jtotal = Jp + Jn = q(nmn + pmp)E Diffusion Current: Jn = -q(-Dn n) Jn = q(-Dp

Montana - EE - 409

SI UNITS Quantity Length Unit Symbol m kg s K A Cd rad Hz N Pa J J eV W C V S F Wb T H Lm Dimensions 10-10 mMeter Angstrom Mass Kilogram Time Second Temperature Kelvin Current Ampere Light Intensity Candela Angle Radian Frequency Hertz Force Newt

Montana - EE - 334

EE334Electromagnetic Theory ITodd KaiserMaxwell's Equations: Maxwell's equations were developed on experimental evidence and have been found to govern all classical electromagnetic phenomena. They can be written in differential or integral form

Montana - EE - 280

EE 280 Spring 2008 Homework #1 Assigned Thursday, March 27, 2008 Due at the start of class on Thursday, April 3, 2008A large, rectangular banquet hall has floor dimensions 20m wide x 60m long, and a floor-to-ceiling height of 15m. The entire main fl

Montana - EE - 417

A Brief Introduction to Musical AcousticsEE417 R.C. Maher Fall 2008Harmonic and Inharmonic Sounds Musical instruments with simple oscillators usually produce periodic waveforms Periodic waveforms have a fundamental frequency, f0, and a harmonic

Montana - EE - 417

Microphone Script (Stereophile)1Shure SM57 ($100; dynamic, cardioid)The high-fidelity initiate, bewitched, bothered, and thoroughly confused by the staggering selection of components he must choose from, often turns to a high-fidelity expert to

Montana - EE - 417

EE417: Microphone Characteristic SummaryOmnidirectional Equation: 3dB Pickup Arc 6dB Pickup Arc Ouput @ 90 Output @ 180 Null Angle Random Energy Efficiency 1 Distance Factor 2 1 (360) (360) 0dB 0dB -1 (0dB) 1Bidirectionalcos 1 2CardioidHype

Montana - EE - 417

EE417 Fall 2008 Homework #3 Assigned Monday, November 3, 2008 Due at the start of class on Monday, November 10, 2008(1) An industrial worker sustains the following noise exposure: 1 hour at 95 dBA 1 hour at 100 dBA How many hours can this worker now

Montana - EE - 417

EE417 Fall 2008 Homework #2 Assigned Monday, October 13, 2008 Due at the start of class on Monday, October 20, 2008 (1) From the K&F textbook: 7.1.4 (2) From the K&F textbook: 7.6.6 (3) A loudspeaker system with two drivers is described by the follow

Montana - EE - 417

EE417Fall 2008 Supplementary Chapter 1 Problems DUE at the start of class on Friday 26 SeptemberName:(1) The drive element of a dynamic speaker is described by the following parameters: mass (voice coil, cap, cone) (m): stiffness (s): 1750 N/m d

Montana - EE - 217

CHAPTER 6Waves in Matterur concern until now has been with simple and complex vibrations that stayed at one place and didn't travel. Many vibrations, including those we hear, travel or propagate as waves from a vibrating source to other places. A

Montana - EE - 445

EE 445-S09 Homework Assignment 6 - Due Friday March 13th hw6- 3-36ac, 3-59,4-2, 4-9,4-23 (90 points) (20)Page 1 of 3EE 445-S09 Homework Assignment 6 - Due Friday March 13th hw6- 3-36ac, 3-59,4-2, 4-9,4-23 (90 points) (10)(10)Page 2 of 3EE 4

Montana - EE - 445

EE 445-S09 Homework Assignment 7 - Due Monday April 6th HW7- 5-4, 5-7, 5-13a-d, 5-23, 5-31 (130 points) (30)Page 1 of 4EE 445-S09 Homework Assignment 7 - Due Monday April 6th HW7- 5-4, 5-7, 5-13a-d, 5-23, 5-31 (130 points) (20)(40)Page 2 of 4

Montana - EE - 412

Course: Instructor:EE 412 ELECTRONIC INSTRUMENTATION DESIGN Andy V. Olson, 631Cobl, 994-5967 andyo@ece.montana.edu EE316- Electronics 2 or equivalent or consent of the instructor. Design with Operational Amplifiers and Analog Integrated Circuits, M