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Lithography

Course: ECE 124, Fall 2009
School: UCSB
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Word Count: 425

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OF UNIVERSITY CALIFORNIA Santa Barbara Electrical and Computer Engineering Department Semiconductor Device Processing Optical lithography The procedures given here are for optical lithography using Shipley AZ 4210, which is a positive photoresist. Spin on Photoresist 1. Place cleaned wafers on the aluminum tray, place the tray on the aluminum block in the furnace. Dehydration bake for 3 minutes at 120 C. 2....

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OF UNIVERSITY CALIFORNIA Santa Barbara Electrical and Computer Engineering Department Semiconductor Device Processing Optical lithography The procedures given here are for optical lithography using Shipley AZ 4210, which is a positive photoresist. Spin on Phot...
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