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EE 330 Lect 16 Fall 2007

Course: EE 330, Fall 2009
School: Iowa State
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330 EE Lecture 16 Model Relationships CMOS Process Flow Quiz 13 Determine the current ID for the following circuit. Assume the MOS transistor can be modeled by the basic square-law model with parameters VT=0.8V, COX=100A/V2 and COX=4fF/2 andB the device has dimensions W=10 and L=2. And the number is .... 1 8 3 5 6 4 9 7 2 And the number is .... 1 7 4 9 3 8 6 2 5 Quiz 13 Determine the current ID for...

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330 EE Lecture 16 Model Relationships CMOS Process Flow Quiz 13 Determine the current ID for the following circuit. Assume the MOS transistor can be modeled by the basic square-law model with parameters VT=0.8V, COX=100A/V2 and COX=4fF/2 andB the device has dimensions W=10 and L=2. And the number is .... 1 8 3 5 6 4 9 7 2 And the number is .... 1 7 4 9 3 8 6 2 5 Quiz 13 Determine the current ID for the following circuit. Assume the MOS transistor can be modeled by the basic square-law model with parameters VT=0.8V, COX=100A/V2 and COX=4fF/2 andB the device has dimensions W=10 and L=2. Solution: 1. 2. 3. 4. Guess the device is operating in the Saturation Region Analyze the circuit with the device in this region Verify region of operation Repeat steps 1-3 if guess was not correct Quiz 13 Solution: 2. Determine the current ID for the following circuit. Assume the MOS transistor can be modeled by the basic square-law model with parameters VT=0.8V, COX=100A/V2 and COX=4fF/2 and the device has dimensions W=10 and L=2. Analyze the circuit with the device in this region 0 W V VGS - VT - DS VDS ID = COX L 2 W (VGS - VT )2 COX 2L VGS VT VGS VT VDS < VGS - VT VGS VT VDS VGS - VT Quiz 13 Solution: 2. Determine the current ID for the following circuit. Assume the MOS transistor can be modeled by the basic square-law model with parameters VT=0.8V, COX=100A/V2 and COX=4fF/2 and the device has dimensions W=10 and L=2. Analyze the circuit with the device in this region W 2 ID = COX ( VGS - VT ) 2L 2 -4 10 = 10 (1.5 - 0.8) 22 ID = 123 A 3. Verify region of operation VGS ? VT 1.5V > 0.8V VDS > ? VGS - VT 3V> 1.5V- 0.8V Verifies! Review from Last Time n-Channel MOSFET Operation and Model VDS VGS VBS ID IG IB (VBS small) Increase VDS even more Inversion layer disappears near drain Termed "saturation"region of operation Saturation first occurs when VDS=VGS-VT ID=? IG=0 IB=0 Review from Last Time Graphical Interpretation of MOS Model C W I= D OX 2L V 2 DS Triode Saturation VGS4 VGS3 VGS2 VGS1 0 V W I = C V - V - V L 2 W (V - V ) C 2L DS D OX GS T 2 OX GS T V V GS GS Cutoff T T DS V V V < V -V DS GS T V V GS T V V -V DS GS T Model Status Square-Law Model VGS4 VGS3 VGS2 VGS1 0 V W I = C V - V - V L 2 W (V - V ) C 2L DS D OX GS T 2 OX GS T V V GS GS T DS V V T V < V -V DS GS T V V GS T V V -V DS GS T Switch-Level Models Drain Gate Source Switch closed for VGS="1" Switch-level model including gate capacitance and drain resistance CGS and RSW dependent upon device sizes and process For minimum-sized devices in a 0.5u process CGS 1.5fF R sw 2K n - channel 6K p - channel Considerable emphasis will be placed upon device sizing to manage CGS and RSW Extended Square-Law Model IG = 0 IB = 0 0 W V I = C V -V - V L 2 W C ( V - V ) (1 + V 2L DS D OX GS T DS 2 OX GS T V V GS GS T V V T V < V -V DS GS T DS ) V V GS T V V -V DS GS T VT = VT0 + ( -V BS - ) Model Parameters : {,COX,VT0,,,} Design Parameters : {W,L} but only one degree of freedom W/L Short-Channel Model 0 W I = C (V - V ) V L W (V - V ) C L 2 2 D OX GS T 1 2 OX GS T V V GS GS T DS V V T V < (V -V DS 1 GS DS GS T ) 2 V V GS T V (V -V 1 T ) 2 is the velocity saturation index, 2 1 Channel length modulation () and bulk effects can be added to the velocity Saturation as well BSIM model BSIM Binning Model - multiple BSIM models ! Model Relationships Determine RSW and CGS for an n-channel MOSFET from square-law model In the 0.5u CMOS process if L=1u, W=1u (Assume COX=100AV-2, COX=2.5fFu-2,VT0=1V, VDD=3.5V, VSS=0) 0 W V I = C V -V - V L 2 W C (V - V ) 2L DS D OX GS T 2 OX GS T V V GS GS T DS V V T V < V -V DS GS T V V GS T V V -V DS GS T When SW is on, operation is "deep" triode Model Relationships Determine RSW and CGS for an n-channel MOSFET from square-law model In the 0.5u CMOS process if L=1u, W=1u (Assume COX=100AV-2, COX=2.5fFu-2,VT0=1V, VDD=3.5V, VSS=0) I C D OX V = W W V -V - V C (V - V ) V L 2 L DS GS T DS OX GS T DS R = SQ V I DS = VGS =VDD 1 C OX D W (V - V L GS T ) VGS =3.5V = 1 = 4K 1 ( E - 4) ( 3.5 - 1) 1 CGS= COXWL = (2.5fF-2)(12) = 2.5fF Model Relationships Determine RSW and CGS for an p-channel MOSFET from square-law model In the 0.5u CMOS process if L=1u, W=1u ( COX=2.5fFu-2,VT0=1V, VDD=3.5V, VSS=0) Observe n\ p3 0 W V I = C V -V - V L 2 W C (V - V ) 2L DS D OX GS T 2 OX GS T V V GS GS T DS V V T V < V -V DS GS T V V GS T V V -V DS GS T When SW is on, operation is "deep" triode Model Relationships Determine RSW and CGS for an p-channel MOSFET from square-law model In the 0.5u CMOS process if L=1u, W=1u ( COX=2.5fFu-2,VT0=1V, VDD=3.5V, VSS=0) Observe n\ p3 0 W V I = C V -V - V L 2 W C (V - V ) 2L DS D OX GS T 2 OX GS T V V GS GS T DS V V T V < V -V DS GS T V V GS T V V -V DS GS T When SW is on, operation is "deep" triode Model Relationships Determine RSW and CGS for an p-channel MOSFET from square-law model In the 0.5u CMOS process if L=1u, W=1u ( COX=2.5fFu-2,VT0=1V, VDD=3.5V, VSS=0) Observe n\ p3 I =C D p OX V W W V -V - V C (V - V ) V L 2 L DS GS T DS p OX GS T DS R = SQ V I DS = VGS =VDD 1 C p OX D W (V - V L GS T ) VGS =3.5V = 1 = 12 K 1 1 ( E - 4) ( 3.5 - 1) 3 1 CGS= COXWL = (2.5fF-2)(12) = 2.5fF Observe the resistance of the p-channel device is approximately 3 times larger than that of the n-channel device for same bias and dimensions ! Modeling of the MOSFET Goal: Obtain a mathematical relationship between the port variables of a device. I = f (V ,V , V ) IB = f3 (VGS ,V DS , VBS ) IG = f2 (VGS ,V DS , VBS ) D 1 GS DS BS Small-Signal Model Goal with small signal model is to predict performance of circuit or device in the vicinity of an operating point Operating point is often termed Q-point Small-Signal Model y YQ Q-point XQ x Technology Files Design Rules Process Flow (Fabrication Technology) (will discussion next ) Model Parameters (will discuss in substantially more detail after device operation and more advanced models are introduced) This table discusses a p-well process flow, an n-well process flow is actually used in the following set of slides with straightforward modifications of this process flow. Bulk CMOS Process Description n-well process Single Metal Only Depicted Double Poly Components Shown n-channe...

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