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EE 330 Lect 2 Fall 2011

Course: EE 330, Fall 2011
School: Iowa State
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330 EE Lecture 2 Basic Concepts Review from Last Time Challenges Managing increasing device count Short lead time from conception to marketplace Process technology advances Device Performance Degradation Increasing variability Increasing pressure for cost reduction Power Dissipation Review from Last Time Creation of Integrated Circuits Most integrated circuits are comprised of transistors along with a...

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330 EE Lecture 2 Basic Concepts Review from Last Time Challenges Managing increasing device count Short lead time from conception to marketplace Process technology advances Device Performance Degradation Increasing variability Increasing pressure for cost reduction Power Dissipation Review from Last Time Creation of Integrated Circuits Most integrated circuits are comprised of transistors along with a small number of passive components and maybe a few diodes This course will focus on understanding how transistors operate and on how they can be interconnected and possibly combined with a small number of passive components to form useful integrated circuits Review from Last Time Semiconductor Industry is One of the Largest Sectors in the World Economy and Growing Rapidly Growing Device Count and Rapidly Shrinking Feature Sizes (Moore's Law?) Designers Must Handle Incredible Complexity Yet Work in Large Teams and Make Almost No Mistakes Review from Last Time ITRS Technology Predictions ITRS 2004 Supply Voltage Predictions 3.5 3 2.5 Volts 2 1.5 1 0.5 0 2000 Analog Digital 2005 2010 YEAR 2015 2020 Review from Last Time ITRS Technology Predictions Minimum ASIC Gate Length 120 Length in nm 100 80 60 40 20 0 2000 2005 2010 YEAR 2015 2020 Selected Semiconductror Company Profiles Texas Instruments: World's largest producer of analog semiconductors, 2nd in DSP Ranks 3rd in World in semiconductor sales Number of employees: 28,400 2010 sales: 2010 income: $14.0B $3.2B Average annual sales/employee: $490K Average annual earnings/employee: $113K Selected Semiconductror Company Profiles Intel: World's largest producer of semiconductors Cofounders: Robert Noyce and Gordon Moore Number of employees: 82,500 2010 sales: 2010 income: $43.6B $11.5B Robert Noyce BA Grinnell 1949 Average annual sales/employee: $528K Average annual earnings/employee: $139K Selected Semiconductror Company Profiles Marvell: Cofounders: Sehat Sutardja (CEO), Welli Dai and Pantas Sutardja Number of employees: 5890 2010 sales: 2010 income: $3.6B $904M Sehat Sutardja Average annual sales/employee: $611K Average annual earnings/employee: $159K Fabless Semiconductor Company BSEE IASTATE (approx 1985) Considerable Cash Flow Inherent in the Semiconductor Industry Essentially All Activities Driven by Economic Considerations Many Designs Cost Tens of Millions of Dollars Mask Set and Production of New Circuit Approaching $2 Million New Foundries Costs Approaching $10 Billion (few players in World can compete) Many Companies Now Contract Fabrication (Fabless Semiconductor Companies) Time to Market is Usually Critical Single Design Error Often Causes Months of Delay and Requires New Mask Set Potential Rewards in Semiconductor Industry are Very High Will emphasize economic considerations throughout this course Understanding of the Big Picture is Critical Solving Design Problems can be Challenging Be sure to solve the right problem ! How can complex circuits with a very large number of transistors be efficiently designed with low probability of error? Many designers often work on a single design Single error in reasoning, in circuit design, or in implementing circuit on silicon generally results in failure Design costs and fabrication costs for test circuits are very high Design costs for even rather routine circuits often a few million dollars and some much more Masks and processing for state of the art processes often between $1M and $2M Although much re-use is common on many designs, considerable new circuits that have never been designed or tested are often required Time to market critical missing a deadline by even a week or 2 may kill the market potential How can complex circuits with a very large number of transistors be efficiently designed with low probability of error? CAD tools and CAD-tool environment critical for success today Small number of VLSI CAD toolset vendors CAD toolset helps the engineer and it is highly unlikely the CAD tools will replace the design engineer An emphasis in this course is placed on using toolset to support the design process CAD Environment for Integrated Circuit Design Typical Tool Flow (See Chapter 14 of Text) Laboratory Experiments in Course VLSI Design Flow Summary Analog Flow System Description Circuit Design (Schematic) Print Circuit Schematic SPICE Simulation Simulation Results Layout/DRC... Extraction DRC Report LVS Back-Annotated Extraction Post-Layout Simulation LVS Output File Post-Layout Simulation Fabrication VLSI Design Flow Summary Analog Flow Cadence Virtuoso System Description Circuit Design (Schematic) Schematic Editor Print Circuit Schematic SPICE Simulation Simulation Results Spectre (or HSPICE) Layout/DRC... Assura DRC Extraction Assura RCX DRC Report LVS Assura LVS LVS Output File Back-Annotated Extraction Post-Layout Simulation Spectre (or HSPICE) Post-Layout Simulation Fabrication Digital Flow VLSI Design Flow Summary System Description Verilog Description Verilog Simulation Synthesis (Synopsys) Simulate (Gate Level) VHDL Simulation Results and And Comparison with System Specs. Gate-level Simulation Print Circuit Schematic Place and Route (SoC Encounter) --- --- or DEF GDS2 File -------DRC DRC Report Circuit Schematic (Cadence) Connectivity Report and Show Routing to TA LVS Extraction Back-Annotated Extraction Post-Layout Simulation Post-Layout Simulation LVS Output File Fabrication Digital Flow VLSI Design Flow Summary System Description Verilog Description Cadence SoC Encounter VHDL Simulation Results and And Comparison with System Specs. Gate-level Simulation Verilog XL Verilog Simulation Synthesis Synopsis Simulate (Gate Level) Place and Route (SoC Encounter) --- --- DEF or GDS2 File -------DRC DRC Report Print Circuit Schematic Verilog XL Circuit Schematic (Cadence) Connectivity Report and Show Routing to TA LVS Extraction Back-Annotated Extraction Post-Layout Simulation Post-Layout Simulation LVS Output File Fabrication Mixed Signal Flow (Digital Part) System Description VHDL Description VLSI Design Flow Summary VHDL Simulation Results and And Comparison with System Specs. Gate-level Simulation VHDL Simulation Synthesis (Synopsys) Simulate (Gate Level) Place and Route (Silicon Ensemble) --- --- DEF or GDS2 File -------DRC DRC Report Print Circuit Schematic Circuit Schematic (Cadence) Connectivity Report and Show Routing to TA LVS Extraction Back-Annotated Extraction Post-Layout Simulation LVS Output File Post-Layout Simulation A B VLSI Design Flow Summary Mixed-Signal Flow (Analog Part) System Description Circuit Design (Schematic) Print Circuit Schematic SPICE Simulation Simulation Results Layout/DRC Extraction Back-Annotated Extraction Post-Layout Simulation LVS DRC Report LVS Output File Post-Layout Simulation C D VLSI Design Flow Summary Mixed-Signal Flow (Analog-Digital Merger) A C D B Layout Merge Show Layout to TA Schematic Merge Extraction LVS/DRC Output Files LVS/DRC Post-Layout Simulation Fabrication Simulation Results Comments The Analog Design Flow is often used for small digital blocks or when particular structure or logic styles are used in digital systems Variants of these flows are widely used and often personalized by a given company or for specific classes of circuits Wafer 6 inches to 12 inches in diameter All complete cells ideally identical flat edge very large number of die if die size is small die Feature Size Feature size is the minimum lateral feature size that can be reliably manufactured Often given as either feature size or pitch Minimum feature size often identical for different features What is meant by "reliably" Yield is acceptable if a very large number of these features are made If P is the probability that a feature is good n is the number of features on an IC Y is the yield YP n Pe loge Y n Example: How reliable must a feature be? n=5E3 Y=0.9 loge Y n loge 0.9 5E3 Pe e =0.999979 But is n=5000 large enough ? More realistically n=5E9 loge Y n loge 0.9 5E9 Pe e =0.999999999979 Extremely high reliability must be achieved in all processing steps to obtain acceptable yields in state of the art processes Feature Size Typically minimum length of a transistor Often minimum width or spacing of a metal interconnect (wire) Point of "bragging" by foundries Drawn length and actual length differ Often specified in terms of pitch Pitch approximately equal to twice minimum feature size Feature Size Evolution Mid 70's 25 2005 2010 2020 90nm 20nm 10nm 1 103 nm 106 m 104 A o MOS Transistor Active Poly MOS Transistor W Source L Drain Gate Drawn Length and Width Shown Region of Interest (Channel) MOS Transistor W Source L Drain Gate Actual Drain and Source at Edges of Channel MOS Transistor Weff L eff Source Drain Gate Effective Width and Length Generally Smaller than Drawn Width and Length Technology Nomenclature SSI MSI LSI VLSI Small Scale Integration 1-100 Medium Scale Integration 100-103 Large Scale Integration 103-105 Very Large Scale Integration 105-106 Any design in a process capable of incorporating a large number of devices is generally termed a VLSI design Device and Die Costs Consider the high-volume incremental costs of manufacturing integrated circuits Example: Assume an 8" wafer in a 0.25 process costs $800 Determine the number of minimum-sized transistors that can be fabricated on this wafer and the cost per transistor. Neglect spacing and interconnect. Solution: ntrans Ctrans Awafer Atrans Cwafer ntrans 4in 2 5.2 E11 2 0.25 $800 $15.4 E 9 5.2 E11 Note: the device count may be decreased by a factor of 10 or more if Interconnect and spacing is included but even with this decrease, the cost per transistor is still very low! Device and Die Costs C per unit area $2.5 / cm 2 Example: If the die area of the 741 op amp is 1.8mm2, determine the cost of the silicon needed to fabricate this op amp C741 $2.5 / cm 2 1.8mm2 $.05 Actual integrated op amp will be dramatically less if bonding pads are not needed Size of Atoms and Molecules in Semiconductor Processes o Silicon: Average Atom Spacing Lattice Constant 2.7 A o 5.4 A o SiO2 Average Atom Spacing 3.5 A 5 to 10MV/cm 5 to10mV/ A 0 Breakdown Voltage Air 20KV/cm Physical size of atoms and molecules place fundamental limit on conventional scaling approaches End of Lecture 2
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