h17_lecture12_2

h17_lecture12_2 - Lecture 12 Process Variations Feedback...

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EE 214 Lecture 12 (HO#17) B. Murmann 1 Lecture 12 Process Variations Feedback Boris Murmann Stanford University murmann@stanford.edu Copyright © 2004 by Boris Murmann EE 214 Lecture 12 (HO#17) B. Murmann 2 Overview Reading – 8.0, 8.1, 8.2, 8.3 (Feedback) – 9.2 (Relation Between Gain and Bandwidth) – Supplementary Handout "Feedback Systems" by Tom Lee (see web, optional) Introduction – In today's lecture we will first take a look at typical component variations in CMOS technology. In light of these numbers, we then consider negative feedback as a tool for building amplifiers with precisely defined gain. As we shall see, using a forward amplifier with "high", but arbitrary gain, combined with a ratiometric, passive feedback network allows us to build drift and process insensitive precision gain stages.
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EE 214 Lecture 12 (HO#17) B. Murmann 3 PVT So far, we've assumed that our Spice model accurately predicts the performance of every single chip we make We have also assumed that all our circuits run at room temperature, and V DD is precisely fixed In practice, it is the circuit designer's job to ensure that the circuit works in presence of large variations – PROCESS: Variations among production lots • "Slow, Nominal and Fast" corners
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This note was uploaded on 04/17/2008 for the course EE 214 taught by Professor Murmann,b during the Fall '04 term at Stanford.

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h17_lecture12_2 - Lecture 12 Process Variations Feedback...

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