454Spring08HW1_Solution

454Spring08HW1_Solution - ECEN 454 Digital Integrated...

Info iconThis preview shows pages 1–2. Sign up to view the full content.

View Full Document Right Arrow Icon
1 ECEN 454 Digital Integrated Circuit Design Spring 2008 Homework 1 Solution Problem 1. (5 points) Suppose that you want to implement a 1-k Ω resistor using n-type diffusion region. The n-type diffusion has a sheet resistance of 100 Ω per square, i.e., a 4um-long 2um-wide line of diffusion has a resistance of 100ohms x 4um/ 2um = 200 ohms (the depth of diffusion is controlled by the process and cannot be changed by the designer). You also need to connect each end of your diffusion resistor to a piece of metal 1 (1 st metal layer) via a contact to allow the wiring of the resistor. According to the design rules, the minimum line width for metal 1 and n-diffusion are both 1um, and there should be a minimum 0.5um extension of metal and diffusion over the contact cut. 1) Draw three masks for the diffusion, metal 1 and contact layers for fabricating your resistor. 2) Does your design provide an exact 1-k Ω resistance? If not, what may be the factors impacting your final resistance value? 3)
Background image of page 1

Info iconThis preview has intentionally blurred sections. Sign up to view the full version.

View Full DocumentRight Arrow Icon
Image of page 2
This is the end of the preview. Sign up to access the rest of the document.

This note was uploaded on 04/17/2008 for the course ELEN 454 taught by Professor Jianghu during the Spring '08 term at Texas A&M.

Page1 / 5

454Spring08HW1_Solution - ECEN 454 Digital Integrated...

This preview shows document pages 1 - 2. Sign up to view the full document.

View Full Document Right Arrow Icon
Ask a homework question - tutors are online