ENGRI111_7_nanofab1

ENGRI111_7_nanofab1 - ENGRI 111 ENGRI 111 Nanofabrication...

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Unformatted text preview: ENGRI 111 ENGRI 111 Nanofabrication Nanofabrication MOSFET MOSFET http:/ / jas.eng.buffalo.edu/ education/ fab/ NMOS/ nmos.html Basic Fabrication Steps Basic Fabrication Steps Oxidation Photolithography Etching I on I mplantation Metallization Thermal Oxidation Thermal Oxidation SiO 2 I nsulation layers Barrier to diffusion or implantation during device fabrication Dry oxidation – thin films, good interphase Si (solid) + O 2(vapor) SiO 2(solid) Wet oxidation –thicker films, faster process Si (solid) + H 2 O (vapor) SiO 2(solid) + 2H 2(vapor) Photoresists Photoresists Used to transfer pattern Polymer (plastic) Applied by spin coating Positive Exposed area becomes more soluble Negative Exposed area becomes less soluble Sources Light, electron beam www.cnf.cornell.edu Etching Etching Wet SiO 2 + HF H 2 SiF6 + 2H 2 O Dry Plasma Etching Plasma is an ionized gas that contains electrons, radicals and ions Etching Etching Etch r ate I ncreases throughput Unifor mity Same etch rate across wafer Selectivity Relative etch rate for different materials Damage Structural or electrical...
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This note was uploaded on 02/28/2008 for the course ENGRI 1110 taught by Professor Giannelis during the Fall '07 term at Cornell.

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ENGRI111_7_nanofab1 - ENGRI 111 ENGRI 111 Nanofabrication...

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