{[ promptMessage ]}

Bookmark it

{[ promptMessage ]}

lec3_device_interconnect_scaling

lec3_device_interconnect_scaling - Device and Interconnect...

Info icon This preview shows pages 1–14. Sign up to view the full content.

View Full Document Right Arrow Icon
Device and Interconnect Scaling Device and Interconnect Scaling Ref: Circuits, Interconnections and Packaging of VLSI, H. B. Bakoglu, Addison Wessley (Out of Print) Class Notes
Image of page 1

Info icon This preview has intentionally blurred sections. Sign up to view the full version.

View Full Document Right Arrow Icon
Device and Interconnect Scaling Intel’s IA-64 Itanium Microprocessor Have you ever wondered the following: How does a microprocessor run faster in each new product generation ? For example, in 1991, Intel 386 speed was 16MHz, in 1993, Intel 486 speed was 66MHz, in 1996, Pentium I speed was 300MHz, in 1999, Athalon speed was 900MHz and now Itanium runs faster than 1GHz.
Image of page 2
Device and Interconnect Scaling CMOS Technology Scaling CMOS Technology Scaling GATE SOURCE BODY DRAIN Xj Tox D GATE SOURCE DRAIN Leff BODY Dimensions scale down by 30% Doubles transistor density Oxide thickness scales down Faster transistor, higher performance Vdd & Vt scaling Lower active power Technology has scaled well, will it in the future? Technology has scaled well, will it in the future? Courtesy: S. Borkar, Intel
Image of page 3

Info icon This preview has intentionally blurred sections. Sign up to view the full version.

View Full Document Right Arrow Icon
Device and Interconnect Scaling Moore’s Law Empirical law proposed by Gordon Moore in 1965. He made the observation that the components/chip doubles every 18 months Can be attributed to three major factors: Lithography (50% contribution) Increase in chip size (25% contribution) Innovation (25% contribution)
Image of page 4
What is Lithography ? Lithography determines the smallest feature size that can be fabricated on Silicon. The feature size has reduced by a factor of 2X in the last 5 years and continues to decrease Year 1997 1999 2001 2003 2006 2009 2012 Feature Size 250 nm 180 nm 150 nm 130 nm 100 nm 70 nm 50 nm Feature Size < Wavelength (Feature Size = Wavelength/2) Lithography is fast becoming a problem due to the small feature sizes 1000nm 100nm 10nm 1nm Deep UV Ex UV Xray Prox. E Beam 435 & 405
Image of page 5

Info icon This preview has intentionally blurred sections. Sign up to view the full version.

View Full Document Right Arrow Icon
Device and Interconnect Scaling Xj Tox D GATE SOURCE DRAIN Leff BODY Basic Operation of MOSFET
Image of page 6
Device and Interconnect Scaling
Image of page 7

Info icon This preview has intentionally blurred sections. Sign up to view the full version.

View Full Document Right Arrow Icon
Device and Interconnect Scaling
Image of page 8
Device and Interconnect Scaling
Image of page 9

Info icon This preview has intentionally blurred sections. Sign up to view the full version.

View Full Document Right Arrow Icon
Device and Interconnect Scaling Scaling of Local and Global Interconnections
Image of page 10
Device and Interconnect Scaling Distribution of Interconnection Lengths on an IC
Image of page 11

Info icon This preview has intentionally blurred sections. Sign up to view the full version.

View Full Document Right Arrow Icon
Device and Interconnect Scaling
Image of page 12
Device and Interconnect Scaling
Image of page 13

Info icon This preview has intentionally blurred sections. Sign up to view the full version.

View Full Document Right Arrow Icon
Image of page 14
This is the end of the preview. Sign up to access the rest of the document.

{[ snackBarMessage ]}

What students are saying

  • Left Quote Icon

    As a current student on this bumpy collegiate pathway, I stumbled upon Course Hero, where I can find study resources for nearly all my courses, get online help from tutors 24/7, and even share my old projects, papers, and lecture notes with other students.

    Student Picture

    Kiran Temple University Fox School of Business ‘17, Course Hero Intern

  • Left Quote Icon

    I cannot even describe how much Course Hero helped me this summer. It’s truly become something I can always rely on and help me. In the end, I was not only able to survive summer classes, but I was able to thrive thanks to Course Hero.

    Student Picture

    Dana University of Pennsylvania ‘17, Course Hero Intern

  • Left Quote Icon

    The ability to access any university’s resources through Course Hero proved invaluable in my case. I was behind on Tulane coursework and actually used UCLA’s materials to help me move forward and get everything together on time.

    Student Picture

    Jill Tulane University ‘16, Course Hero Intern