4500PL05 - Longitudinal Chromatic Aberration in...

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Longitudinal Chromatic Aberration in Convex-Plano Lens Longitudinal chromatic aberration is a limiting factor in modern deep-ultraviolet micro-lithography which is used in making integrated circuits. Commonly, a krypton Fuoride excimer laser that emits at a wavelength of 248 nm is used. Even though the spread of wavelengths is very small (about ± 0 . 001 nm ), this amount produces noticeable deleterious effects in the very ±ne lines of the resulting integrated circuit patterns. To illustrate chromatic aberration, consider imaging with a convex-plano lens. The lens is made of BK-7 glass. The lens has a radius of curvature of 25 mm and a cen- ter thickness of 5 . 00 mm . This lens is illuminated in air with a collimated beam of white light that is 30 mm in diameter. The axis of the beam is centered on the axis of the lens. Using exact ray tracing, calculate, showing all work, the longitudinal chromatic aberration for the above convex-plano lens con±guration. Do this for the most marginal
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This note was uploaded on 04/29/2008 for the course ECE 4500 taught by Professor Gaylord during the Spring '08 term at Georgia Institute of Technology.

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4500PL05 - Longitudinal Chromatic Aberration in...

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