Unformatted text preview: which appears in the figure at the bottom of the page. 5. Crossectional Schematic: Construct diagrams (arranged vertically on a single page) representing a cross sectional view of your wafer at every stage of the process performed so far, from the initial unprocessed wafer through the patterning of the photoresist. Sketches should contain the silicon, oxide (if present), and photoresist (if present). A total of 4 sketches should do. These may be done (neatly) by hand....
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- Fall '07
- The Mask, Field Oxide, thickness uniformity, initial unprocessed wafer