Lab__2_questions

Lab__2_questions - which appears in the figure at the...

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Lab Analysis: 1. Uniformity of Field Oxide: Determine the thickness uniformity of the Field Oxide on your wafer based on your measurements at the 5 points. 2. Uniformity of Photoresist : Determine the thickness uniformity of the resist on your wafer based on your measurements at the 5 points. 3. Given your knowledge of how each film is formed, explain why the film you expected to be more uniform, actually is. 4. Mask Reproduction in Resist: Compare the pattern image you observed under the microscope on your resist-post development with the one taken directly off the mask,
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Unformatted text preview: which appears in the figure at the bottom of the page. 5. Crossectional Schematic: Construct diagrams (arranged vertically on a single page) representing a cross sectional view of your wafer at every stage of the process performed so far, from the initial unprocessed wafer through the patterning of the photoresist. Sketches should contain the silicon, oxide (if present), and photoresist (if present). A total of 4 sketches should do. These may be done (neatly) by hand....
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This note was uploaded on 04/04/2009 for the course ECE 5360 taught by Professor Shealy during the Fall '07 term at Cornell.

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