Week-7-litho-II

Week-7-litho-II - EE-438L :Introduction to Microelectronic...

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10/06/09 Dr. Kian Kaviani - Spring 2009, EE 1 EE-438L :Introduction to Microelectronic Processing Dr. Kian Kaviani University of Southern California Viterbi School of Engineering Ming Hsieh Electrical Engineering Dept.
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10/06/09 Dr. Kian Kaviani - Spring 2009, EE 2 Hardware The concept of pattern generation capability is a measure of the degree which the pattern being printed can be “fit” relative to a previously printed pattern The dimensional control requirement in microlithography refers to the ability to produce feature sizes over the entire wafer surface with high accuracy and precision. The throughput of the pattern transfer process is an important, but not always overriding, process characteristics.
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10/06/09 Dr. Kian Kaviani - Spring 2009, EE 3 Hardware Development in Microlithography Contact Printing (1958 – 1970s ; minimum feature size capability ~ 2 μ m) Issues: 1: Mask Integrity 2: Defects Associated with the Mask 3: one – to – one correspondence between the mask and the minimum feature size
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10/06/09 Dr. Kian Kaviani - Spring 2009, EE 4 Various Modes of Printing
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10/06/09 Dr. Kian Kaviani - Spring 2009, EE 5 Spectrum of UV Light
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10/06/09 Dr. Kian Kaviani - Spring 2009, EE 6 Defects Associated with Contact Printing Masks
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10/06/09 Dr. Kian Kaviani - Spring 2009, EE 7 Masks
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10/06/09 Dr. Kian Kaviani - Spring 2009, EE 8 Proximity Printing
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10/06/09 Dr. Kian Kaviani - Spring 2009, EE 9 Optical Projection Systems Projection optical lithography systems became the standard technique in the 1970s when the proximity optical microlithography could no longer meet the resolution requirements for ICs Wafer and mask were far apart (~ 1 ft) The spherical reflective mirror was used to project the image of the mask onto the wafer. Because the projector operates at 1X magnification, a rather
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Week-7-litho-II - EE-438L :Introduction to Microelectronic...

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