Homework%202%20Solutions

Homework%202%20Solutions - EE 215 Spring 06 Homework #2 1)...

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Unformatted text preview: EE 215 Spring 06 Homework #2 1) Use L-Edit to spell out your name in poly0. An example of my name is shown below: Once you have spelled out your name, make a 100x100 array of your name. An example using my name is shown below: 2) Using the minimum combinations of deposited oxide and polysilicon films, create a mask set and surface micromachining process flow that will produce a wheel that can rotate freely about a hub that extends over the top of the wheel. A rough sketch is shown below. Both features are made of polysilicon. Shading is used to distinguish the hub from the rotor, which is free to rotate. It is also free to fall down to touch the substrate, but is shown lifted to emphasize that it is not connected to the substrate. EE 215 Spring 06 Homework #2 The following mask set and process flow will produce a wheel that can rotate freely about a hub that extends over the top of the wheel. It requires only two masks and four deposited layers (two oxide, two polysilicon). Deposit 2 m sacrificial oxide (PSG); Ox 1 Starting wafer, Si(100), 525 m thick Deposit 2 m polysilicon; poly 1 Deposit 2 m sacrificial oxide (PSG); Ox 1 Starting wafer, Si(100), 525 m thick Deposit 2 m polysilicon; poly 1 Expose positive photoresist with Mask 1 Poly 1 Spin-on positive photoresist Expose positive photoresist with Mask 1 Poly 1 Spin-on positive photoresist EE 215 Spring 06 Homework #2...
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This note was uploaded on 11/21/2008 for the course EE 215 taught by Professor Joelkubby during the Fall '05 term at UCSC.

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Homework%202%20Solutions - EE 215 Spring 06 Homework #2 1)...

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