Homework%205

Homework%205 - Choose suitably large mask openings and...

Info iconThis preview shows page 1. Sign up to view the full content.

View Full Document Right Arrow Icon
EE 215 Spring 06 Homework #5 1) Liu problem 10.3 2) Liu problem 10.8 3) Liu problem 10.9 4) Liu problem 10.10 5) (a) Run the anisotropic etch simulation for one sided and (b) two sided etching of a <100> wafer in IntelliSuite. (c) What would happen for two sided etching of a <100> wafer if the mask openings are large enough to allow the etch pits formed on either side to intersect each other in the middle of the wafer?
Background image of page 1
This is the end of the preview. Sign up to access the rest of the document.

Unformatted text preview: Choose suitably large mask openings and simulate this situation. Print out images of each of the final etch results above for (a) through (c). 6) Liu problem 11.9. You can use the standard PolyMUMPS software and template we have been using for our design projects. 7) Liu problem 11.12. The device design should include nozzles, fluid chambers, heaters, and ink inlets....
View Full Document

Ask a homework question - tutors are online