Electrical Engineering 40 - Spring 1999 - Howe - Midterm 2

Electrical Engineering 40 - Spring 1999 - Howe - Midterm 2...

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1 University of California at Berkeley College of Engineering Dept. of Electrical Engineering and Computer Sciences EECS 40 Midterm II Spring 1999 Prof. Roger T. Howe April 14, 1999 Name: ______________________ Student ID _____________ last, first Guidelines 1. Closed book and notes; one 8.5” x 11” page (both sides) of your own notes is allowed. 2. You may use a calculator. 3. Do not unstaple the exam. 4. Show all your work and reasoning on the exam in order to receive full or partial credit. Score Problem Points Possible Score 1 20 2 20 3 10 Total 50
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2 1. Micromirror Structure [20 points] Poly1 Mask (clear field) Oxide1 Mask (clear field) Oxide2 Mask (dark field) Metal Mask (clear field) y , [ μ m] 0 2 4 x , [ μ m] B’ 10 6 0 8 4 2 6 8 10 12 14 16 18 B A A’ Poly2 Mask (clear field) 1 2 1 1 1 3 1 2 3 V 1 V 2 V 3
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3 Process Sequence : 1. Starting material: phosphorus-doped silicon, concentration 5 x 10 16 cm -3 2. Deposit 200 nm of silicon nitride (see properties below) 3. Deposit 200 nm of n-type polysilicon and pattern using poly1 mask (clear field) 4. Deposit 400 nm of silicon dioxide and pattern using the
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This note was uploaded on 05/17/2009 for the course EE 40 taught by Professor Chang-hasnain during the Spring '07 term at Berkeley.

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Electrical Engineering 40 - Spring 1999 - Howe - Midterm 2...

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