lecture34 - Lecture #34 HW#10 is posted online - use 11/16...

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Lecture 34, Slide 1 EECS40, Fall 2003 Prof. King Lecture #34 HW#10 is posted online -- use 11/16 version! OUTLINE Modern IC Fabrication Technology – Lithography trends – Plasma processing – Rapid thermal annealing – Chemical mechanical polishing Reading (Rabaey et al .) (Finish Chapter 2.2) Lecture 34, Slide 2 EECS40, Fall 2003 Prof. King Photolithography chromium quartz plate 2 types of photoresist: – positive tone: portion exposed to light will be dissolved in developer solution – negative tone: portion exposed to light will NOT be dissolved in developer solution from Atlas of IC Technologies by W. Maly
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Lecture 34, Slide 3 EECS40, Fall 2003 Prof. King Projection Printing Considerations Small l m is desired! minimum feature size l m : Intel’s Lithography Roadmap Lecture 34, Slide 4 EECS40, Fall 2003 Prof. King Depth of Focus Large z is desirable. depth of focus ≡∆ z :
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Lecture 34, Slide 5 EECS40, Fall 2003 Prof. King Lithography determines the minimum feature size
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This note was uploaded on 08/23/2009 for the course EECS 40 taught by Professor Chang-hasnain during the Fall '08 term at Berkeley.

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lecture34 - Lecture #34 HW#10 is posted online - use 11/16...

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