EbeamLithography - Electron Beam Lithography Rob Ilic...

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Electron Beam Lithography Rob Ilic
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February 19 2008 Electron Beam Lithography, page 2 Outline ± What is Nanolithography and what are the technologies used? ± Electron Beam Lithography ² Why use e beams for lithography? ² Electron Beam Lithography Technology ² CNF e beam systems ² Examples of research done with e Beam Lithography ² Pattern Design (CAD) and Processing for e Beam Lithography ² E Beam Resist Materials ± Resist Processing – Hybrid Lithography
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February 19 2008 Electron Beam Lithography, page 3 Nanolithography is a tool for Nanotechnology ± Nanotechnology —A term referring to a wide range of technologies that measure, manipulate, or incorporate materials and/or features with at least one dimension between approximately 1 and 100 nanometers (nm). Such applications exploit the properties, distinct from bulk/macroscopic systems, of nanoscale components. – ASTM E 2456-06, Terminology for Nanotechnology, 2006 ± Nanolithography - lithography to make printed features smaller than 100 nm.
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February 19 2008 Electron Beam Lithography, page 4 Technologies to Accomplish Nanolithography Multiple parallel nozzles and/or fountain pen systems may make it faster. Low Sold by NanoInk Dip-pen Lithography Doesn’t make arbitrary shapes High In NNIN (UNM) Interference Lithography Several methods in use; would require 1:1 masters Low to Moderate In NNIN (U.T. Austin, Penn State) , soon at CNF Nano-imprint Lithography Used in hybrid processes with optical lithography, for example disk read/write heads Low At CNF and other NNIN sites Electron Beam Lithography All-reflective optics because λ = 13. 5 nm High? Intel says they’ll be using it by 2009 Extreme Ultraviolet (EUV) Lithography (soft X-rays) Ultimate resolution limit probably about 18 nm High ASML and Nikon selling systems for 45 nm half pitch features Immersion (optical) Lithography Comments Throughput Availability Technology Forman, et al., Pushing the limits of light, Small Times, July, 2006, http://www.smalltimes.com/articles/stm_print_screen.cfm?ARTICLE_ID=260007
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Electron Beam Technology
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February 19 2008 Electron Beam Lithography, page 6 Why Use Electron Beams? Not diffraction-limited; resolution < 20 nm Light diffraction limits minimum feature size to about 45 nm now and ultimately about 18 nm Point by point exposure limits speed Parallel exposure, entire field exposed at once High speed for small, complex patterns High speed for large shapes E Beam Lithography Optical Lithography
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February 19 2008 Electron Beam Lithography, page 7 E Beam Lithography Procedure ± Design Pattern with CAD ² Proximity Correction (optional) ² Convert Pattern to Machine Format ± Choose Resist and Apply to Sample ± Expose ± Develop ± Other processing ² Etch ² Metal deposition and liftoff
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February 19 2008 Electron Beam Lithography, page 8 E-Beam Scan Basics Bojko, Richard, CNF EBMF Manual Control Computer With Stored Pattern Data “Pattern Generator” (Data Decoder) 4-Bit Digital to Analog Converter Beam Blanker Deflection Coils Substrate
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February 19 2008 Electron Beam Lithography, page 9 Tour through an E Beam Lithography Column 100keV JEOL 9300FS Electron Beam Lithography System
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This note was uploaded on 09/30/2009 for the course MSE 2620 taught by Professor Malliaras during the Spring '09 term at Cornell University (Engineering School).

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EbeamLithography - Electron Beam Lithography Rob Ilic...

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