Presentation 5 oxidation

Presentation 5 oxidation - Metal-Oxide Semiconductor (MOS)...

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Unformatted text preview: Metal-Oxide Semiconductor (MOS) Process How to Make a MOSFET P-type Si (100) Field Oxidation To Define Source & Drain How to Make a MOSFET Phosphorus Phosphorus pre-deposition diffusion oxidize Driven-in diffusion How to Make a MOSFET Gate Oxide definition Gate Oxidation Contact Vias How to Make a MOSFET Aluminum eposition deposition Metal pattern MOSFET How to Make a MOSFET Thermal Oxidation of Silicon The use of Oxide Oxide layer can be used to mask against in-diffusing impurities SiO2 protects the devices from water vapor and other contaminants (chemical assivation e use o O de passivation). SiO2 reduces the density of energy states in the bandgap at the SI interface (electrical passivation) Si)2 is used as the insulator in metal-oxide-semiconductor (MOS) devices 1 m Field Oxides Thermally Grown Oxides Oxide Thickness Deposited Oxides Backend Insulators 0.1 m Masking Oxides e d O des Between Metal Layers Masking Oxides 10 nm Gate Oxides Tunneling Oxides Pad Oxides 1 nm Chemical Oxides from Cleaning Native Oxides Thermal Oxidation of Silicon Two types of thermal growth oxide Oxidation Dry o types o t e a g o t o de...
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Presentation 5 oxidation - Metal-Oxide Semiconductor (MOS)...

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