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1 半導體製程多變量最佳化批次控制之研究 (2 3) 計畫編號: NSC95-2221-E-155-033 執行期限: 95 8 1 日至 96 7 31 主持人 :范書愷 元智大學工業工程與管理所 參與人員:林晏 元智大學工業工程與管理所 摘要 本研究提出一個具處理雙反應多變量且 適用於 R2R 製程的最佳化控制器。本控制 器稱為「雙反應最適化控制器」 (adaptive dual-response optimizing controller ADROC) ;該控制器在製程批次行進間, 可不斷地提供製程 ( 機台 ) 最適合的操作 參數,讓製程反應值達到最佳化的要求。 本控制器針對二階的多變量非線性製程 模型加以設計,但限制製程模型反應值必 須簡化為主要反應值與次要反應值。 在實際製程中,製程常因為機台需要 暖機或是長久使用之損耗,甚至電壓、電 流等外部因素,導致製程隨著時間有飄移 的現象,這使得製程在控制上,為了達到 最佳化的需求,必須因應這些變化不停地 修正操作參數。如此, ADROC 控制器在 設計上,嵌入了 ST 控制器的線上估計技 術,在機台行進間將控制模型的參數做出 最適合的調整,然後整合雙反應系統演算 法計算出最佳的操作參數迴饋給機台。在 模擬實作的部分,本研究針對半導體製程 中 的 晶 圓 平 坦 化 製 程 (CMP) , 來 做 為 ADROC 的模擬實作模型。由於 CMP 製程 中,晶圓的移除率以及表面的不平整度是 極重要的兩個反應值,所以本研究藉由此 具雙反應值特性的 R2R 製程,來測試 ADROC 對於雙反應多變量製程模型的控 制表現。 ABSTRACT This paper presents an optimization-based, multiple-input dual-output (MIDO) run to run (R2R) controller for general semicon- ductor manufacturing processes. This con- troller, termed adaptive dual response opti- mizing controller (ADROC), can serve as a recipe regulator between consecutive runs of wafer fabrication. In ADROC, an on-line estimation technique is implemented in a self-tuning (ST) control manner for the ad- aptation purpose. Subsequently, an ad hoc global optimization algorithm based on the dual response approach is used to seek the optimum recipe within the acceptability re- gion for the execution of next run. Typical applications of R2R control to Chemical Mechanical Planarization (CMP) in semi- conductor manufacturing are demonstrated through simulated processes to illustrate ADROC. The procedure is compared to three benchmark methods (OAQC, single- and double-EWMA controllers) in a simula- tion experiment. Key Words Process Adjustment; Run to Run Feedback Control; Semiconductor Manufacturing; Dual Response Optimization; On-line Qual- ity Control.
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2 1. Introduction In practice, there are two general approaches achieving the goal of process control: statis- tical process control (SPC) and engineering process control (EPC). A particular type of EPC approaches that will be addressed in
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