EECE 321: Electronics-I (Spring 2006, University of New Mexico)Homework-VII (Due Date: Thursday April 27th, In class) In the class, we learnt about the fabrication process for a CMOS inverter. In the following process, draw the masks used for various steps and identify the various processes ( e.g, diffusion, polysilicon deposition, metal deposition, etc...). Use a clear field mask and identify whether you are using a positive or negative photoresist. How many masks are used in this process.
has intentionally blurred sections.
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