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Lecture_3_MEMS_09 - MEMS/NEMS LECTURE#3 Fundamental...

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MEMS/NEMS LECTURE #3 Fundamental processes: CMOS and LIGA Example of a multi-user technology Modeling of MEMS
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Content of the presentation Transistor and resistor fabrication steps LIGA process Designing with MUMPS Post-processing Active structures The issues related to the design Modeling of mechanical microstructures Detail of modeling Dynamic characterization of mechanical systems Natural frequency and frequency modes
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Silicon Transistor and Resistor Fabrication Flow
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Top view of n-type silicon wafer n-type silicon wafer Cross-sections of the silicon wafer are shown below. 1. WAFER PREPARATION Use n-type silicon wafers. Identify wafers. Scribe ID numbers. Measure and record rezistivity. Clean wafers acid clean . Silicon Transistor Fabrication Flow
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n-type silicon wafer silicon dioxide INITIAL OXIDATION Oxide Growth. Temp = 1050 C, Time = 120 min Inspect Wafers Measure and record oxide thickness Masking for diffusion
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