cmosfab - FabricationandProcessingofMOStransistor...

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Adaptive Integrated Microsystems Fabrication and Processing of MOS transistor Chapter 2 ( Section  2.1 & 2.3) ECE 412 Introduction to mixed-signal circuits (Fall 2007) Class website: http://www.egr.msu.edu/classes/ece412/shantanu
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Adaptive Integrated Microsystems
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Adaptive Integrated Microsystems Final outcome 3mm
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Adaptive Integrated Microsystems
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Adaptive Integrated Microsystems
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Adaptive Integrated Microsystems
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Adaptive Integrated Microsystems
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Adaptive Integrated Microsystems
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Adaptive Integrated Microsystems
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Adaptive Integrated Microsystems
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Adaptive Integrated Microsystems Silicon oxide – silicon interface
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Adaptive Integrated Microsystems
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Adaptive Integrated Microsystems
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Adaptive Integrated Microsystems New generation of miniaturization
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Adaptive Integrated Microsystems
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Adaptive Integrated Microsystems
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Adaptive Integrated Microsystems
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Adaptive Integrated Microsystems Example of an inverter - There are 4 input/output pins. - The bulk/substrate for pMOS transistor is connected to Vdd. - The bulk/substrate of nMOS transistor is connected to gnd.
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Adaptive Integrated Microsystems step 1 Form N-Well regions Grow oxide Deposit photoresist Layout view Cross section view p-type substrate NWELL mask NWELL mask oxide
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Adaptive Integrated Microsystems step 1 Form N-Well regions Grow oxide Deposit photoresist Pattern photoresist NWELL Mask expose only n-well areas Layout view Cross section view p-type substrate NWELL mask NWELL mask oxide photoresist
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Adaptive Integrated Microsystems step 1 Form N-Well regions Grow oxide Deposit photoresist Pattern photoresist NWELL Mask expose only n-well areas Etch oxide Remove photresist Layout view Cross section view p-type substrate oxide
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Adaptive Integrated Microsystems step 1 Form N-Well regions Grow oxide Deposit photoresist Pattern photoresist NWELL Mask expose only n-well areas Etch oxide Remove photoresist Diffuse n-type dopants through oxide mask layer Layout view Cross section view p-type substrate n-well
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Adaptive Integrated Microsystems step 2 Form Active Regions Deposit SiN over wafer Deposit photoresist over SiN layer ACTIVE mask ACTIVE mask SiN photoresist p-type substrate n-well
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cmosfab - FabricationandProcessingofMOStransistor...

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