Lecture 5 - ME 601: Manufacturing in Micro- and Nanosystems...

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ME 601: Manufacturing in Micro- and Nanosystems Lecture 5: Maskless Optical Lithography, Interference Lithography
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Whither the Mask What are the major limitations of projection masks for photolithography? Brainstorm: how might we improve on this technology – think “outside the mask” Mask technology circa 1965
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Maskless Optical Lithography Factors to consider: Cost of mask – ~ doubled for each technology generation below 65 nm ($900,000 per mask for latest generation) Production run vs. prototype/small volume (research) Number of layers/number of masks needed Maskless lithography (ML2) includes a full range of technologies, many of which are used to make masks for optical projection lithography! Approaches include electron beam lithography ion beam lithography electron and ion projection lithography maskless optical lithography laser direct write lithography interference lithography
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“Old School” Maskless Optical Projection
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MEMS Scanning Optical Lithography Development of Texas Instruments digital micro-mirror array
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This note was uploaded on 03/23/2010 for the course MATERIAL S 601 taught by Professor Samual during the Spring '10 term at Wisconsin.

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Lecture 5 - ME 601: Manufacturing in Micro- and Nanosystems...

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