Lecture 8 - ME 601: Manufacturing in Micro- and Nanosystems...

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ME 601: Manufacturing in Micro- and Nanosystems Lecture 8: Microstereolithography and Multiphoton Polymerization
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Microstereolithography We discussed maskless optical lithography in Lecture 6, where modulation of light intensity was used to generate patterns in 2D. Is this planar or probe-based technology? The same technique can be extended to 3D in a layer-by- layer fashion Had origin in rapid prototyping technique developed in 80’s: selective laser sintering (SLS), also called stereolithography Also similar to slurry based technique developed at MIT in mid 90’s: three-dimensional printing (3DP) Uses conventional photoresist (visible -> UV wavelengths), viscosity optimized to produce desired interlayer thickness Falls into a broad class of technologies known as solid freeform fabrication (SFF)
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Microstereolithography Process Process has 5 basic steps: 1. Generate computer model using CAD/CAM tools. How does this compare with conventional manufacturing? 2. Convert raw data to STL format: define tool paths, consider unreacted polymer than may be ‘trapped’, define minimum features and cross sections required for mechanical stability 3. Convert 3D model to 2D slices for layer-by-layer process,
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This note was uploaded on 03/23/2010 for the course MATERIAL S 601 taught by Professor Samual during the Spring '10 term at Wisconsin.

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Lecture 8 - ME 601: Manufacturing in Micro- and Nanosystems...

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