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Lecture 9 - ME 601 Manufacturing in Micro and Nanosystems...

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ME 601: Manufacturing in Micro- and Nanosystems Lecture 9: Electron Beam Lithography Principles and Systems
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What is Electron Beam Lithography? Scanning lithography approach, minimum feature size ~ 10 nm Tightly focused electron beam is rastered over special resists to expose features First developed in 1960s using existing SEM technology, 60 nm features achieved as early as 1970s!
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