Lecture 16 - ME 601: Manufacturing in Micro- and...

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ME 601: Manufacturing in Micro- and Nanosystems Lecture 16: Nanoimprint Lithography, Step and Flash
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Replication: direct mechanical contact to transfer pattern from a mold, stamp, or master to a substrate Familiar commercial analogies? Nanoimprint lithography has advantages of both optical lithography and direct write technologies (e-beam/ion beam, scanning probe) First developed by Stephen Chou in 1995, now well established technology though not yet widespread in manufacturing. Why? Officially included on ITRS in 2003 as “Next Generation Lithography” (NGL). Other options? Patterning by Replication
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Early Replication Process: Compact Discs
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Thermal Press Nanoimprint Similar to hot embossing process used to make micron scale structures Resist heated to 50-100 C above T g , pressure of 700-1400 psi applied Hard contact between stamp and substrate avoided. Why? Resist cooled and stamp removed
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Lecture 16 - ME 601: Manufacturing in Micro- and...

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