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Lecture 17 - ME 601 Manufacturing in Micro and Nanosystems...

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ME 601: Manufacturing in Micro- and Nanosystems Lecture 17: UV Cured Nanoimprint, Step and Flash
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Disadvantages of thermal nanoimprint Throughput – why? Temperature and pressure – effect on manufacturability? Pressure required scales with temperature (remember viscosity dependence) Elastic vs. plastic deformation: recovery/relaxation effect Solution: room temperature nanoimprint lithography (RT- NIL), depends on alternative imprinting medium Hydrane (HS2550): T g at 0-10 C, melting point 30 C, offers significant low temperature performance vs. PMMA and PS Trade-off: more pronounced relaxation effect; can imprint with continuously increasing pressure (stepped) – allows 75 nm L/S patterns to be achieved Room Temperature Nanoimprint
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