Attenuation - Oxide Deposition Etching using RIE Standard...

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Attenuation (material losses,  bending, fabrication, non-linear  effects) In the Book: Chapter 8 
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BOx: 3μm Si: 250nm Si Substrate BOx: 3μm Si Substrate BOx: 3μm Si Substrate Width = 450nm Ebeam Lithography EBeam Resist
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Unformatted text preview: Oxide Deposition Etching using RIE Standard Fabrication 400nm Rayleigh Radiation AutoShape 2 Bending light Bending light 1 m How does this work??? Content Placeholder 4 AutoShape 3...
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This note was uploaded on 08/10/2010 for the course ECE 4370 at Cornell University (Engineering School).

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Attenuation - Oxide Deposition Etching using RIE Standard...

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