Hw1 - Fundamentals of Microfabrication BIOEN 6421 EL EN 5221 6221 ME EN 5050 6050 Homework 1 Homework#1 Due Wednesday in class 1 Analyze each of

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Fundamentals of Microfabrication Homework 1 BIOEN 6421, EL EN 5221 & 6221, ME EN 5050 & 6050 2/23/10 Homework #1 Due Wednesday, January 27, 2010 in class 1. Analyze each of the expressions for photolithography resolution and explain how to maximize resolution in every case. What are the advantages and disadvantages of using e-beam lithography compared to typical photolithography using UV radiation? What is the most likely next generation lithography? Discuss resolution expressions on pgs 21-22, Text book. E-beam lithography, refer text book. Most likely next generation lithography will be deep UV or modification to existing lithography approach e.g. immersion lithography. X-ray is out due to prohibitive costs. Nanoimprint is still in its infancy and has significant issues with respect to sustainable molds. 2. Why is it easier (or not easier) to obtain a lift-off profile with a negative resist than with a positive resist? Undercut
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This note was uploaded on 09/02/2010 for the course MEEN 5050 taught by Professor Himanshuj.sant during the Spring '10 term at University of Utah.

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Hw1 - Fundamentals of Microfabrication BIOEN 6421 EL EN 5221 6221 ME EN 5050 6050 Homework 1 Homework#1 Due Wednesday in class 1 Analyze each of

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