Homework set 1 Solutions1. The three components of photoresist are: the resin, solvent and photoactive compound.The resist is bakes after spinning primarily to remove any remaining solvents.2. (a) The width and spacing of the developed resist structures would be 0.5m.(b) If the exposure time and therefore the dose is reduced by 10%, the width of the sine wavepattern at the threshold dose for exposure is reduced. This width can be derived by solving forthe values of xtthere the dose equals the threshold for exposure (1.0 = 0.9 [sin2xt+1.0]). Thewidth of the exposed pattern where the positive resist will be developed and removed is0.46m leaving 0.54m resist widths. Please note that the exposed positive resist is removed
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Positive resist, effective dose pattern, sine wave pattern