243S2009-10

243S2009-10 - N.CHEUNG,Sp 2009 EE243: ADVANCED IC...

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N.CHEUNG,Sp 2009 EE243: ADVANCED IC PROCESSING AND LAYOUT Homework Assignment # 10 (Due May 6) Reading Assignment : “Fundamentals of Sermiconductor Manufacturing and Process Control, “ by May and Spanos [ Wiley-Interscience] 4.1.2.1, 4.2, 4.3, 4.4 (Basic stats with emphasis on normal distributions) 6.1, 6.2, 6.4.1, 6.4.3 (Univariate SPC) 7.1 7.2 (Analysis of Variance) 7.3.1. (2-level Factorials) Problem 1 Confidence interval for the mean with unknown variance A new process has been developed for spin-coating photoresist. Ten wafers have been tested with the new process, and the results of thickness measurments (in μ m) are shown below. Find a 99% confidence interval on the mean photoresist thickness. 13.3946 13.4002 13.3987 13.3957 13.3902 13.4015 13.4001 13.3918 13.3965 13.3925 Problem 2 Hypothesis Testing Suppose we are interested in calibrating a chemical vapor deposition furnace. The furnace will be shut down for repairs if significant difference is found between the thermocouples
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243S2009-10 - N.CHEUNG,Sp 2009 EE243: ADVANCED IC...

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