243S2008-03 - Sp2008 EECS 243 ADVANCED IC PROCESSING AND...

Info icon This preview shows pages 1–2. Sign up to view the full content.

View Full Document Right Arrow Icon
Sp2008 N.CHEUNG EECS 243: ADVANCED IC PROCESSING AND LAYOUT Homework Assignment #3 (Due Feb 20, Wed 9:30am) Reading Assignment : Plummer et al Chapter 8 on ion implantation Problem 1 Accelerating voltage, effective implant energy, ion dose, and atomic concentration An ion implanter with an accelerating voltage of 50kV is used for implantation of the following ions into Si to a dose of 1E14 ions /cm 2 : 1) B(+) [ atomic boron ion, singly charged] 2) B(2+) [ atomic boron ion, doubly charged] 3) BF 2 (+) [molecular BF 2 ion, singly charged] 4) B 10 H 14 (+) [molecular B 10 H 14 ion, singly charged] Sketch qualitatively the implanted boron depth profiles [ boron atomic concentration versus depth ] of the four ions on the same plot. Indicate the peak positions and Use a gaussian profile approximation to estimate the peak concentration. You can use range data from textbooks or the SRIM program. Problem 2 Minimum dose required to create a continuous layer of amorphous Si The number of displaced substrate atoms per incident ion N D is E o 2E d where E o
Image of page 1

Info iconThis preview has intentionally blurred sections. Sign up to view the full version.

View Full Document Right Arrow Icon
Image of page 2
This is the end of the preview. Sign up to access the rest of the document.

{[ snackBarMessage ]}

What students are saying

  • Left Quote Icon

    As a current student on this bumpy collegiate pathway, I stumbled upon Course Hero, where I can find study resources for nearly all my courses, get online help from tutors 24/7, and even share my old projects, papers, and lecture notes with other students.

    Student Picture

    Kiran Temple University Fox School of Business ‘17, Course Hero Intern

  • Left Quote Icon

    I cannot even describe how much Course Hero helped me this summer. It’s truly become something I can always rely on and help me. In the end, I was not only able to survive summer classes, but I was able to thrive thanks to Course Hero.

    Student Picture

    Dana University of Pennsylvania ‘17, Course Hero Intern

  • Left Quote Icon

    The ability to access any university’s resources through Course Hero proved invaluable in my case. I was behind on Tulane coursework and actually used UCLA’s materials to help me move forward and get everything together on time.

    Student Picture

    Jill Tulane University ‘16, Course Hero Intern