243S2008-05 - N.Cheung, Sp 2008 EE 243: ADVANCED IC...

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N.Cheung, Sp 2008 EE 243: ADVANCED IC PROCESSING AND LAYOUT Homework Assignment #5 (Due Mar 12 Wed) Reading Assignment : PDG, Chap 5, especially pp. 247-277 – Modeling EE243 Lecture notes Handout – Sheats and Smith Chap 3 Problem 1 INCOHERENT Source Image Intensity Calculation using MTF A binary mask intensity I mask with equal lines and spaces can be expanded as a Fourier seriesalong the x- direct6ion: I o + I o 4 π sin( 2 π x L ) + I o 4 3 π sin( 6 π x L ) + I o 4 5 π sin( 10 π x L ) + . ....... where L is the period of the pattern. After passing through an incoherent projection optical system, the image intensity will be the sum of each intensity Fourier component multiplied by its corresponding Modulation Transfer Function (MTF). (a) If the projection system has NA=0.35 and a wavelength of 436nm, sketch qualitatively the image intensity I(x) as a function of position x for a mask with 0.8 µ m lines and 0.8 µ m spaces. [You may use the following approximation for incoherent MTF = 1- 2 λν π NA , where ν = spatial frequency] (b) Calculate
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This note was uploaded on 11/02/2010 for the course EECS 243 taught by Professor Ee243 during the Spring '03 term at University of California, Berkeley.

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243S2008-05 - N.Cheung, Sp 2008 EE 243: ADVANCED IC...

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