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243S2008-10 - N.CHEUNG,Sp 2008 EEC243 ADVANCED IC...

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N.CHEUNG,Sp 2008 EEC243: ADVANCED IC PROCESSING AND LAYOUT Homework Assignment # 10 (Don’t have turn in, solutions will be posted on 5/13) Reading Assignment : “Fundamentals of Sermiconductor Manufacturing and Process Control, “ by May and Spanos [ Wiley-Interscience] 4.1.2.1, 4.2, 4.3, 4.4 (Basic stats with emphasis on normal distributions) 6.1, 6.2, 6.4.1, 6.4.3 (Univariate SPC) 7.1 7.2 (Analysis of Variance) 7.3.1. (2-level Factorials) Problem 1 Confidence interval for the mean with unknown variance A new process has been developed for spin-coating photoresist. Ten wafers have been tested with the new process, and the results of thickness measurments (in µ m) are shown below. Find a 99% confidence interval on the mean photoresist thickness. 13.3946 13.4002 13.3987 13.3957 13.3902 13.4015 13.4001 13.3918 13.3965 13.3925 Problem 2 Hypothesis Testing Suppose we are interested in calibrating a chemical vapor deposition furnace. The furnace will be shut down for repairs if significant difference is found between the thermocouples that are measuring the deposition temperature at the two ends of the furnace tube. The following temperatures have been measured during several test runs:
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