243S2008-10-soln

# 243S2008-10-soln - N.CHEUNG,Sp 2008 EEC243 ADVANCED IC...

This preview shows pages 1–2. Sign up to view the full content.

This preview has intentionally blurred sections. Sign up to view the full version.

View Full Document
This is the end of the preview. Sign up to access the rest of the document.

Unformatted text preview: N.CHEUNG,Sp 2008 EEC243: ADVANCED IC PROCESSING AND LAYOUT Homework Assignment # 10 (Don’t have turn in, solutions will be posted on 5/13) Reading Assignment : “Fundamentals of Sermiconductor Manufacturing and Process Control, “ by May and Spanos [ Wiley-Interscience] 4.1.2.1, 4.2, 4.3, 4.4 (Basic stats with emphasis on normal distributions) 6.1, 6.2, 6.4.1, 6.4.3 (Univariate SPC) 7.1 7.2 (Analysis of Variance) 7.3.1. (2-level Factorials) Problem 1 Confidence interval for the mean with unknown variance A new process has been developed for spin-coating photoresist. Ten wafers have been tested with the new process, and the results of thickness measurments (in µ m) are shown below. Find a 99% confidence interval on the mean photoresist thickness. 13.3946 13.4002 13.3987 13.3957 13.3902 13.4015 13.4001 13.3918 13.3965 13.3925 n = 10, ∑ = = 1 1 1 n i i x n x = 13.3962, ∑ = − − = n i i x x n s 1 2 2 ) ( 1 1 = 1.5278e-5, s = 0.0039 n s t x n s t x n n 1 , 2 1 , 2 − − + ≤ ≤ − α...
View Full Document

{[ snackBarMessage ]}

### Page1 / 4

243S2008-10-soln - N.CHEUNG,Sp 2008 EEC243 ADVANCED IC...

This preview shows document pages 1 - 2. Sign up to view the full document.

View Full Document
Ask a homework question - tutors are online