243S2009-10-soln

243S2009-10-soln - N.CHEUNG,Sp 2009 EE243 HW#10 Solutions...

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Unformatted text preview: N.CHEUNG,Sp 2009 EE243 HW#10 Solutions Problem 1 Confidence interval for the mean with unknown variance A new process has been developed for spin-coating photoresist. Ten wafers have been tested with the new process, and the results of thickness measurments (in µ m) are shown below. Find a 99% confidence interval on the mean photoresist thickness. 13.3946 13.4002 13.3987 13.3957 13.3902 13.4015 13.4001 13.3918 13.3965 13.3925 Don’t know mean and variance, use t-distribution n = 10, ∑ = = 1 1 1 n i i x n x = 13.3962, ∑ = − − = n i i x x n s 1 2 2 ) ( 1 1 = 1.5278e-5, s = 0.0039 n s t x n s t x n n 1 , 2 1 , 2 − − + ≤ ≤ − α α µ where: α = 0.01, 1 , 2 − n t α = 9 , 005 . t = 3.25 → 10 0039 . 25 . 3 3962 . 13 10 0039 . 25 . 3 3962 . 13 + ≤ ≤ − µ 4002 . 13 3922 . 13 ≤ ≤ µ Problem 2 5. Suppose we are interested in calibrating a chemical vapor deposition furnace. The furnace will be shut down for repairs if significant difference is found between the...
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This note was uploaded on 11/02/2010 for the course EECS 243 taught by Professor Ee243 during the Spring '03 term at Berkeley.

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243S2009-10-soln - N.CHEUNG,Sp 2009 EE243 HW#10 Solutions...

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