week-1-clean-room

Week-1-clean-room - EE 504L Solid State Processing and Integrated Solid State Processing and Integrated Circuit Laboratory Dr Kian Kaviani Hsieh

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EE – 504L olid State Processing and Integrated Solid State Processing and Integrated Circuit Laboratory Dr. Kian Kaviani sieh Ming Dept of Electrical Engineering Hsieh Ming Dept. of Electrical Engineering USC Viterbi School of Engineering 1/3/2011 Dr. Kian Kaviani, Spring 2011- EE504L 1
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Types of Contamination in the Clean Room ypes o Co ta at o t e C ea oo • 1. Particulates – A: Silicon dust – B: Quartz dust : Atmospheric dust – C: Atmospheric dust – D: Generated from the Personnel – E: Generated from the Equipment • 2. Films 3. Trace Quantities of substances in molecular or atomic form 1/3/2011 Dr. Kian Kaviani, Spring 2011- EE504L 2
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1. Particulates a t cu ates – Silicon dust – Quartz dust – Atmospheric dust – Generated from the Personnel – Generated from the Equipment – Photo resist chunks – Bacteria (from the DI water) 1/3/2011 Dr. Kian Kaviani, Spring 2011- EE504L 3
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ontaminations in the Clean Room Co ta at o s t e C ea oo 1/3/2011 Dr. Kian Kaviani, Spring 2011- EE504L 4
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MIF: Standard Mechanical Interface S Sta da d ec a ca te ace 1/3/2011 Dr. Kian Kaviani, Spring 2011- EE504L 5
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MIF in Action for 300 mm Wafers S ct o o 300 a e s 1/3/2011 Dr. Kian Kaviani, Spring 2011- EE504L 6
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This note was uploaded on 02/23/2011 for the course EE 474 taught by Professor Lingo during the Spring '11 term at USC.

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Week-1-clean-room - EE 504L Solid State Processing and Integrated Solid State Processing and Integrated Circuit Laboratory Dr Kian Kaviani Hsieh

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