Week-6-a-litho-I

Week-6-a-litho-I - EE-504L :Solid State Processing and...

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EE-504L :Solid State Processing and Integrated Circuit Laboratory Dr. Kian Kaviani sieh Ming Dept of Electrical Hsieh Ming Dept. of Electrical Engineering University of Southern California Viterbi School of Engineering 1/3/2011 Dr. Kian Kaviani - Spring 2011 - EE504L 1
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ardware Hardware • The concept of pattern generation capability is a measure of the degree which the pattern being printed can be “fit” relative to a previously printed pattern The dimensional control requirement in microlithography refers to the ability to produce feature sizes over the entire wafer surface with high accuracy and precision. • The throughput of the pattern transfer process is an portant but not always overriding process important, but not always overriding, process characteristics. 1/3/2011 Dr. Kian Kaviani - Spring 2011 - EE504L 2
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Hardware Development in Microlithography ad ae eeop e t cot ogap y Contact Printing (1958 – 1970s ; minimum feature size capability ~ 2 µ m) Issues: 1: Mask Integrity 2: Defects Associated with the Mask : one ne correspondence between the 3: one – to – one correspondence between the mask and the minimum feature size 1/3/2011 Dr. Kian Kaviani - Spring 2011 - EE504L 3
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arious Modes of Printing Various Modes of Printing 1/3/2011 Dr. Kian Kaviani - Spring 2011 - EE504L 4
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pectrum of UV Light Spectrum of UV Light 1/3/2011 Dr. Kian Kaviani - Spring 2011 - EE504L 5
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Defects Associated with Contact Printing Masks 1/3/2011 Dr. Kian Kaviani - Spring 2011 - EE504L 6
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asks Masks 1/3/2011 Dr. Kian Kaviani - Spring 2011 - EE504L 7
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roximity Printing Proximity Printing 1/3/2011 Dr. Kian Kaviani - Spring 2011 - EE504L 8
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ptical Projection Systems Optical Projection Systems •P r o jection optical lithography systems became the standard technique in the 1970s when the proximity optical microlithography could no longer meet the solution requirements for ICs resolution requirements for ICs Wafer and mask were far apart (~ 1 ft) he spherical reflective mirror was used to project the The spherical reflective mirror was used to project the image of the mask onto the wafer.
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This note was uploaded on 02/23/2011 for the course EE 474 taught by Professor Lingo during the Spring '11 term at USC.

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Week-6-a-litho-I - EE-504L :Solid State Processing and...

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