Week-14-Testing-1

Week-14-Testing-1 - Electrical Characterization of the...

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Electrical Characterization f the Finished Wafers of the Finished Wafers Part – I Dr. Kian Kaviani Hsieh Ming Electrical Engineering Dept. USC Viterbi School of Engineering 1/3/2011 Dr. Kian Kaviani Spring 2011 EE504L 1
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heet Resistance Measurements Sheet Resistance Measurements The resistance R of a rectangular block of uniformly doped material is given by: •R = ρ .L/A = ( ρ. L)/(W.t) = R sh (L / W) effective R : Resistivity of the material (ohm – cm) L : Length of the block (cm) W: Width of the block (cm) A : Area of cross section of the block (cm2) : Thickness of the block (cm) t R sh : Sheet Resistance of the block (ohm/square) 1/3/2011 Dr. Kian Kaviani Spring 2011 EE504L 2
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heet Resistance Measurements Sheet Resistance Measurements (L/W) effective: Effective Number of squares = (L/W) length + (L/W) pads + (L/W) bends The most commonly used techniques in industrial environment are the Transfer Line Measurement ( TLM ) and ransfer Line Method lso LM 1/3/2011 Dr. Kian Kaviani Spring 2011 EE504L 3 Transfer Line Method (also TLM !).
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ransmission Line Method (TLM) Transmission Line Method (TLM) 1/3/2011 Dr. Kian Kaviani Spring 2011 EE504L 4
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ransfer Line Method (TLM) Transfer Line Method (TLM) • The total Resistance (R T ) measured on the scope is sum of the Resistance due to the wire& probe tips (usually small and neglected) +Resistance due to the contact metal (R m ) + Resistance due to the metal- semiconductor contact (Ohmic Contact : R c ) and the resistance of the doped layer (R s ). R T = 2R m + 2R c + R s 1/3/2011 Dr. Kian Kaviani Spring 2011 EE504L 5
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ransmission Line Method (TLM) Transmission Line Method (TLM) •R m value compared to R c & R s is small and we usually neglect that, that results in: R T = 2R c + R s Where: s= R h /A Rs= R
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Week-14-Testing-1 - Electrical Characterization of the...

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