Ellipsometry for nano mod

Ellipsometry for nano mod - Ellipsometry for...

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Unformatted text preview: Ellipsometry for nano-characterization Ilsin An Dept. of Physics and Bio-nano Engineering, Hanyang University Ansan 426-791, Korea Abstract Ellipsometry has long been used for the characterization of thin films and surfaces. It can determine both the optical properties and the microstructural parameters of films. However its lateral resolution is poor in contrast to its sub-nanometer resolution for thickness. Despite this drawback, it can contribute to the studies of nano-scaled materials and nano-device fabrications either in direct or indirect way. In this work, principles of several novel ellipsometers are introduced. Also some applications of these ellipsometers are introduced for the characterization of nano-structured materials and industrial processing for lithography. Keywords: Thin film, Surface roughness, Ellipsometry I. Introduction Since Drude had introduced its principle, ellipsometry has been used for more than a hundred years to study surfaces, interfaces, and thin films [1]. Over the period, various ellipsometries has been developed and also much improvement has been achieved in hardware as well as in software for more complicated analysis. In particular, with the advent of minicomputers in the late 1960’s there had been numerous efforts on the automation of ellipsometers using various approaches. A common feature is that the time for a single measurement of { Ψ ∆ , } becomes 10 3 to 10 8 times faster than the manually operated ellipsometer. Two approaches have been made, a real time ellipsometer with single wavelength and a wavelength-scanning spectroscopic ellipsometer. The former was used to study the kinetics of thin film growth and surface modification with limited capacity.The latter was used to study the optical or microstructural properties of thin films and surfaces [2, 3]. In 1980’s a real time spectroscopic ellipsometer was developed by employing one dimensional multichannel detection system [4]. This novel instrument was based on rotating polarizer type ellipsometer equipped with spectrograph and 1024-pixeled photodiode array. This system has been applied to thin film growth in vacuum environment and abundant information was deduced such as nucleation density, growth rate, void concentration, as well as optical functions [5-9]. Thanks to the modern electronics technology, now two dimensional array detectors such as charge-coupled device (CCD) and complementary metal oxide semiconductor (CMOS) detectors are available. With these detection systems, another approach for ellipsometry becomes possible, that is, imaging ellipsometry [10-13]. This can be applied to many of the fields where conventional ellipsometry has been used to further provide distributional information in small area. Many found its new applications in biomedical area such as protein micro-array where label-free detection is required [13, 14]. Also we found that this technique has potential application in defect detection in immersion lithography....
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This note was uploaded on 03/15/2011 for the course FISICA 101 taught by Professor Chavez during the Spring '11 term at ASU.

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Ellipsometry for nano mod - Ellipsometry for...

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