1-Patel-ebl - Free electrons emitted from the cathode now...

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Electron Beam Lithography (EBL) Biren Patel ECE 3080 November 23, 2004
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Outline Photolithography The need for EBL How EBL works
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Photolithography Spin photoresist Align mask Expose Develop
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Photolithography Limited to an order of .1 um. 1.Device sizes are now on the same order as the wavelength of the UV light leading to diffraction problems. 2.Mask resolution is reaching its limits during manufacture.
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Electron Beam Lithography (EBL) JEOL JBX-9300FS
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How EBL works General Idea: Direct a beam of electrons to a sample that is coated with an electron sensitive substance.
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Generating Electrons Electrons are produced by cathodes in an electron gun. Because of price and reliability, cathodes made of tungsten tend to be the most popular. Electrons are emitted using either thermionic emission or field emission. Thermionic emission tends to have a greater efficiency in producing electrons.
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Beam Shaping
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Unformatted text preview: Free electrons emitted from the cathode now need to be shaped into a beam. • Electron guns have electrodes that use focusing and deflection to create a beam from the free electrons. Three electrode telefocus gun Triode gradient gun Two electrode Pierce gun Beam Guidance ● The object of the Beam Guidance system is to transform the beam’s focal parameters, such as current density and beam diameter, into the parameters required by the application. ● This is achieved by imaging, focusing, and deflecting the beam according to the laws that govern electron optics. ● Magnetic fields are used as a magnetic lens to image and focus while magnetic bipoles are used for deflecting. Results ~30nm lines in concentric rings 160nm star pattern with ~30nm dot 80nm circle for photonic crystal 20 - 30nm lines in mesh pattern 4.2 x 4.6um Georgia Tech logo 31nm circles...
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This note was uploaded on 08/23/2011 for the course ECE 3080 taught by Professor Staff during the Spring '08 term at Georgia Tech.

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1-Patel-ebl - Free electrons emitted from the cathode now...

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