{[ promptMessage ]}

Bookmark it

{[ promptMessage ]}

lec25 - Lecture Tuesday Chemical Vapor Desposition SiH2 can...

Info iconThis preview shows pages 1–2. Sign up to view the full content.

View Full Document Right Arrow Icon
Lecture Tuesday 4/15/08 2 2 2 2 2 2 4 ~ ~ ~ ~ H S S SiH S SiH S SiH H SiH SiH + → ⋅ ⋅ ↔ + + ↔ Chemical Vapor Desposition SiH 2 can be thought of as an active intermediate (rate limiting) 2 2 2 2 2 2 4 4 SiH s dep s SiH SiH v SiH A AD p SiH H SiH g SiH f k r r k f f P k r k P P P k r = = - = - = - v SiH SiH s dep v SiH SiH SiH SiH SiH v SiH A AD SiH s dep f P k k r f P k f k f f P k r f k r 2 2 2 2 2 2 2 2 2 / 0 / = = ⇒ - = ≈ =
Background image of page 1

Info iconThis preview has intentionally blurred sections. Sign up to view the full version.

View Full Document Right Arrow Icon
Area Balance 4 2 4 4 4 2 4 2 2 4 2 2 2 4 4 2 2 2 2 2 2 2 2 2 0 1 1 1 1 1 SiH H SiH SiH p SiH H p SiH SiH S dep H p SiH SiH p SiH H SiH g SiH SiH SiH SiH SiH S dep
Background image of page 2
This is the end of the preview. Sign up to access the rest of the document.
Report
View Full Document Right Arrow Icon

{[ snackBarMessage ]}