MEMS_11 guirenemerging tech_01

MEMS_11 guirenemerging tech_01 - Next generation...

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Next generation lithographies (NGL) NGL (alternative to DUV photolithography) Extreme UV lithography (EUVL) X-ray lithography Charged particle beam lithography E-beam: Scattering with angular limitation projection lithography (SCALPEL) I-beam: Ion projection lithography (IPL) AFM lithography Nanoprinting Photolithography based on nonlinear optics Multiphoton absorption polymerization (MAP) Stimulated emission depletion (STED) etc
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Far-field Optical Nanoscopy: Stimulated Emission Depletion (STED) For nanofabrication
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Introduction Ultrahigh spatial resolution imaging of viable biological cell could provide insight for molecular biology, signal transduction and pathology, etc. Far-field fluorescence microscopy is one of most important tools for noninvasive imaging of interior of transparent objects. Conventional optics for bioimaging suffered from the Abbe’s diffraction limit which is about half the wavelength of the light used when nanoscale resolution is required. New far-field nanoscopic technology have been developed to overcome the diffraction limit The new method can and has been used for nanofabrication recently
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Fluorescence
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Principle of fluorescence Intersystem crossing (Olympus web)
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Principle of STED Fig shows the typical principle of STED microscopy. The smaller the excitation spot, the higher the spatial resolution of the microscope. The trick with STED is that one uses a second beam (STED beam) which is reflected by another dichroic mirror, to quench the fluorescent markers before they fluoresce through the same objective. If the STED beam is doughnut-shaped and concentric over the excitation spot, one is able to preferentially quench the markers at the outer edge of the excitation spot and not those in the center.
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(Hell, 2005)
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-200 0 200 nm z y x STED Excitation Pinhole DM2 Lens Objective 3-D nano- piezo stage PP EXC spot DM1 Filter Detector + STED spot Effective fluor. Spot (PSF) -200 0 200 nm 70 nm sat I I n x 1 sin Fig. 1 Cartoon Cartoon to explain STED principle
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Cartoon to explain STED principle (Hell 2005)
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Comparison and demonstration (Hell 2009?)
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L 4 Laser 1 R 1 L 2 WP 1 L 1 L 3 PH 2 PH 2 MF DM 2 DM 1 APD OL TS BP R 2 L 5 Laser 2 NC S Pol Pol CP Oil WP 2 PP Counter Computer Carrier plate Schematic of the optical setup Fig. 2.
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Schematic of the STED system Fig. 2 Schematic of the STED system setup. Laser 1 (for excitation) : 405 nm; Laser 2 (for STED) : 532 nm; L 1 , L 2 , L 3 , L 4 and L 5 : optical lenses (f 1 , f 3 =50, f 2 , f 4 =200, f 5 =400, mm); PH 1 and PH 2 : pinholes (h 1 =5 m m, h 2 =50 m m); WP 1 and WP 2 : wave plate (WP 1 : l/2, WP 2 : l/4); Pol : light polarization direction;
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This note was uploaded on 10/03/2011 for the course BMEN 589 taught by Professor Wang during the Spring '11 term at South Carolina.

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MEMS_11 guirenemerging tech_01 - Next generation...

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