MEMS_10 guirenemerging tech_01

MEMS_10 guirenemerging tech_01 - AFM nanofabrication Tang,...

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AFM nanofabrication Tang, Q. et al Journal of nanoscience and nanotechnology, 2004
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AFM nanofabrication AFM can be used to visualize surface image with nanoscale resolution Its tip can be modified to measure properties of Chemical magnetic Electrical Ferroelectric mechanical It can also be used for nanofabrication Tang, Q. et al Journal of nanoscience and nanotechnology, 2004
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AFM nanofabrication Physically or mechanically modify the surface AFM Tip Manipulation of Nanoclusters or Nanoparticles Force Lithography or Direct Mechanical Modification Polarizing Ferroelectric Materials AFM Assisted Electrostatic Nanolithography (AFMEN) Nanofabrication by Chemically Modifying Surfaces Nanografting and Nanopen Reader and Writer (NPRW) Electric Field Enhanced AFM Tip-Directed Nanooxidation AFM Tip-Controlled Surface Reaction Dip-Pen Nanolithography (DPN) Tang, Q. et al Journal of nanoscience and nanotechnology, 2004
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AFM nanofabrication System Tang, Q. et al Journal of nanoscience and nanotechnology, 2004
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Physically modify the surface AFM Tip Manipulation of Nanoclusters or Nanoparticles An AFM tip is used to manipulate and position nanoclusters or nanoparticles (weakly adsorbed on the surface) to a desired place, thus forming nanopatterns. The procedure can be conducted in contact mode nanoparticles or nanoclusters are displaced by applying higher load non-contact mode. 1 st method is to switch off the feedback system when the tip approaches the desired nanoparticle or nanocluster while scanning. The resulting tip-particle contact can further push the particle to a new position. 2 nd : change the setpoint when the tip is approaching the particle. The tip would contact the particle and further push it to a new position
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Physically modify the surface
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Physically modify the surface Force Lithography or Direct Mechanical Modification A rigid AFM tip is used to mechanically modify a soft sample surface by applying certain load in the range of 1000 1500 nN, depending on the substrate. More rigid cantilevers and greater loads are needed for harder samples. The tip may become dull, or even break, if the sample is too hard. Force lithography can be conducted in contact mode or semi-contact mode.
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AFM nanofabrication Tang, Q. et al Journal of nanoscience and nanotechnology, 2004
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AFM fabrication Force Lithography or Direct Mechanical Modification – In contact mode, the contact force not only causes difficulties in the tip moving direction, but also can create undesired features on the sample surface, especially for soft materials. – It’s better to conduct force lithography in semi-contact mode.
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AFM fabrication Force Lithography or Direct Mechanical Modification A schematic illustration of force lithography is shown in Fig.
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This note was uploaded on 10/03/2011 for the course BMEN 589 taught by Professor Wang during the Spring '11 term at South Carolina.

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MEMS_10 guirenemerging tech_01 - AFM nanofabrication Tang,...

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