MEMS_07-08 guiren resolution enhancement_02

MEMS_07-08 guiren resolution enhancement_02 - Chapter 1...

Info iconThis preview shows pages 1–11. Sign up to view the full content.

View Full Document Right Arrow Icon
Chapter 1 Next generation lithographies and Nanofabrication
Background image of page 1

Info iconThis preview has intentionally blurred sections. Sign up to view the full version.

View Full DocumentRight Arrow Icon
Electromagnetics radiation From www.antonine-education.co.uk/physics_gcse
Background image of page 2
Next generation lithographies (NGL) NGL (alternative to DUV photolithography) Extreme UV lithography (EUVL) X-ray lithography Charged particle beam lithography E-beam: Scattering with angular limitation projection lithography (SCALPEL) I-beam: Ion projection lithography (IPL) AFM lithography Nanoprinting Photolithography based on nonlinear optics etc
Background image of page 3

Info iconThis preview has intentionally blurred sections. Sign up to view the full version.

View Full DocumentRight Arrow Icon
Next generation lithographies (NGL) Difference in IC and MEMS: growing IC: Throughput, finer geometry are needed Batch process is a prerequisite MEMS: Modularity, high DOF, height of the feature, incorporating nontraditional materials, replication methods catch the spotlight Batch fabrication is not always a prerequisite Challenges High cost for alternative lithography Technical obstacle for smaller < 100 nm
Background image of page 4
Extreme UV lithography (EUVL) Wavelength 10-140 nm Straight forward based on equ. 1.15 and 1.28 Easier operation Can achieve sub-100 nm feature while maintain DOF > 0.5 um Drawback: Strongly be absorbed by virtually all materials Imaging must be done in vacuum All camera optics and mask must be reflective rather than refractive New resist is required
Background image of page 5

Info iconThis preview has intentionally blurred sections. Sign up to view the full version.

View Full DocumentRight Arrow Icon
Extreme UV lithography (EUVL) EUV reflectivity Low reflectivity for near normal incidence at those short wavelength for most materials Multilayer Bragg reflectors with multiple reflecting coating is needed Advantages: No thin membranes are needed as in the case of x- ray lithography, just a solid substrate with required reflective coating and a patterned EUV absorber Due to 4:1 reduction, mask is easier to make Disadvantage: Defect density in the reflective coating need to be so small that there are few techniques available yet to accomplish such defect free films
Background image of page 6
X-ray lithography Advantages: Shorter wavelength Large DOF Exposure time and development conditions are not stringent Immune to low-atomic-number (Z) particle contamination (dust) Diffraction effect are generally negligible if λ ~/< 1 nm Proximity mask can be used -> increase mask lifetime Line width decreases with proximity gap -> 150 nm High aspect ratio -> 100 High reproducibility since results are independent of Substrate type Surface reflections Wafer topography
Background image of page 7

Info iconThis preview has intentionally blurred sections. Sign up to view the full version.

View Full DocumentRight Arrow Icon
X-ray lithography Disadvantages: No image reduction -> 1:1 No many manufacturers High cost of sufficiently bright x-ray source Low sensitivity of resist Health? Comparison with others
Background image of page 8
X-ray lithography: LIGA LIGA: Lithograpgie Galvanoformung, Abformung Invented ~ 25 ys Exploits all advantages of x-ray lithography Resist can be micrometers - centimeters Can make continuous tilt angle structure High precision
Background image of page 9

Info iconThis preview has intentionally blurred sections. Sign up to view the full version.

View Full DocumentRight Arrow Icon
X-ray lithography: LIGA LIGA: process
Background image of page 10
Image of page 11
This is the end of the preview. Sign up to access the rest of the document.

This note was uploaded on 10/03/2011 for the course BMEN 589 taught by Professor Wang during the Spring '11 term at South Carolina.

Page1 / 36

MEMS_07-08 guiren resolution enhancement_02 - Chapter 1...

This preview shows document pages 1 - 11. Sign up to view the full document.

View Full Document Right Arrow Icon
Ask a homework question - tutors are online