MEMS_06 guiren resolution enhancement_01

MEMS_06 guiren resolution enhancement_01 - Chapter 1...

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Chapter 1 Photolithography Resolution Enhancement Technology
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Three main technologies: Resist technology Mask technology Exposure tools All need to be addressed to optimize the resolution RET was relatively expensive Short wavelength was selected Recent much progress in RET Resolution enhancement technology (RET)
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Challenges of conventional resists: Low quantum yield -> fundamental limit on photosensitivity of these resists +resist 0.2-0.3 -resist: 0.5-1 Worse for shorter light wavelength due to unbleachable absorption for +resist Hard to be used for thicker resist Methods for improvement Chemical amplifier resists Image reversal Antireflective coating-thin film interference Thin film imaging Improved resist performance
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Chemical amplification: A single photon initiates a cascade of chemical reaction of sort that characterize a silver halide photographic emulsion system The amplification is based on the photogeneration of a catalytic photoproduct The catalytic photoproduct is often an acidic species, that catalyze scission or cross-linking The catalytic scission or cross linking depends on the post- exposure baking temperature, time and method Improved resist performance
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