Exam II_2008 - electrically connected the closest conductor...

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Exam II, byWilliam Eisenstadt 10/19/2010 Page 1 of 6 EEL 5322 VLSI Circuits and Technology Exam II Open Note, Open Book, 60 Minutes, 100 points, 11/3/2008 PROBLEM 1: (50 Points) NAME . Resistance and Cross Sections and Design Rules: UFID: . i) (10 points). Look at the layout and draw the corresponding IC process cross sections from A to A . Assume 3 levels of metals as in the class notes.
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Exam II, byWilliam Eisenstadt 10/19/2010 Page 2 of 6 ii)( 20 points) Calculate the resistance for the layout from line X to line X in the layout above. Each square is 125nm. Use the parameters from MOSIS below. PROCESS PAR N+ P+ POLY N+BLK PLY+BLK MTL1 MTL2 UNITS Sheet R 4.0 3.0 3.5 59.6 170.5 0.07 0.07 ohms/sq Contact R 5.7 4.8 4.7 2.23 ohms iii) 20 points) Calculate the capacitance from the line to ground for the layout from line X to line X in the layout above. Use the parameters from Rabaey back cover. Hint, when two or more conductors are stacked on top of each other and
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