NNSE618-L24-heteroepitaxy-defects-interfaces

NNSE618-L24-heteroepitaxy-defects-interfaces - NNSE 618...

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Unformatted text preview: NNSE 618 Lecture #24 1 Lecture contents Heteroepitaxy Growth technologies Strain Misfit dislocations NNSE 618 Lecture #24 2 Heteroepitaxy Single crystalline layer on Single crystalline substrate Strong layer-substrate interaction orientation Surface diffusion of adatoms Clean process semiconductors Epitaxy Heterostructures Major challenge: Tailor electronic and/or optical properties Bandgap engineering Carrier confinement (DHS, 2DEG...) Wavefunction engineering Creating wavefunction logic Optical elements engineering Integrated waveguides NNSE 618 Lecture #24 3 Bulk semiconductor crystal growth methods From khup.com NNSE 618 Lecture #24 4 Chemical vapor epitaxy Si epitaxy: Chlorine process Chemical reaction on a heated substrate - SiCl 4 process - Metal-Organic Chemical Vapor Deposition (MOCVD) - Low vapor pressure - Weak bond with metal (organic byproducts are pumped away) - Carbon and Hydrogen incorporation are sometimes a problem III-As MOCVD Trimethylaluminum (actually it exists as a dimer Al 2 (CH 3 ) 6 NNSE 618 Lecture #24 5 Commercial Thomas Swan MOCVD NNSE 618 Lecture #24 6 Atomic structure of a 90 dialocation Physical vapor epitaxy: Molecular Beam Epitaxy (MBE) Cryo-shrouds Sample holder Loadlock Outgasing...
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NNSE618-L24-heteroepitaxy-defects-interfaces - NNSE 618...

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