Lab 05 E-Beam Deposition

Lab 05 E-Beam Deposition - Electron-Beam Deposition...

Info iconThis preview shows pages 1–2. Sign up to view the full content.

View Full Document Right Arrow Icon
Electron-Beam Deposition Laboratory The purpose of this lab is to demonstrate metal deposition using the electron-beam evaporator, and patterning of the deposited metal on your silicon substrate. Half the class will spin on and pattern positive photoresist on your wafer, prior to metal deposition (lift-off), and the rest will pattern the deposited metal after deposition (etching). Once the wafers are prepared for deposition, they will be fixed on the electron-beam substrate chuck and deposited with metal, as follows. 1. Vent chamber a. Make sure latch is down b. “Shift/Function” c. “Auto Vent” – light goes over button 2. Place sample “umbrella” in chamber – raise to level of crystal monitor 3. Place target in chamber a. Open gun shutter – “Gun Shutter” b. Insert crucible and metal - capable of holding up to 4 crucibles c. Close gun shutter – “Gun Shutter” 4. Close chamber and pump down a. “Shift/Function” b. “Auto Pump” – activates roughing pump, then cryopump automatically
Background image of page 1

Info iconThis preview has intentionally blurred sections. Sign up to view the full version.

View Full DocumentRight Arrow Icon
Image of page 2
This is the end of the preview. Sign up to access the rest of the document.

Page1 / 2

Lab 05 E-Beam Deposition - Electron-Beam Deposition...

This preview shows document pages 1 - 2. Sign up to view the full document.

View Full Document Right Arrow Icon
Ask a homework question - tutors are online