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Unformatted text preview: 2 . Use the optical power meter to measure the lamp intensity and figure out the exposure time. ix. Post Bake (I) 65 o C for 1 minute and (II) 95 o C for 3 minute. x. Develop in SU-8 developer for 4 minutes. xi. Clean the SU-8 developer with IPA (avoid acetone.), and then dry with air or nitrogen. xii. Hard bake at 150 o C for 15 minutes. 5. Part#2 Fabrication of PDMS microstructures using soft lithography. i. Add PDMS monomer and curing agent in 10:1 by weight proportion and stir vigorously. We will do 10g base and 1g curing agent. ii. Keep the mixture in the vacuum chamber for 30 minutes to remove air bubbles. iii. Pour degassed elastomer mixture on a clean and polished silicon wafer. iv. Carefully place the wafer in oven at 150 C for 10 min or until PDMS cures. 6. Slowly peel off PDMS microstructure. Measure and compare the height of the PDMS and SU-8 microstructures....
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This note was uploaded on 11/16/2011 for the course MSE 5960 taught by Professor Douglas during the Fall '04 term at University of Florida.
- Fall '04