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Lecture 05 Ji Fang Mask Design. (1)

Lecture 05 Ji Fang Mask Design. (1) - = R/DI R radius of...

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Outline x# Introduction x# Mask Design x# Mask Making x# Design Tools Institute for Micromanufacturing, LA Tech, Ji Fang ENG 594 Introduction x# What is a mask? x# Mask principal parameters: Pattern position Feature size control Defect density x# Mask type: Binary Mask Proximity correction mask Phase shift mask Institute for Micromanufacturing, LA Tech, Ji Fang ENG 594 Printing Methods Contact printing: x# Contact force: 0.05 to 0.3 atm x# Wavelength near 400 nm. x# Line width is possible under 1 P m x# The ‘work mask’ must be replaced after every 5-25 operations. Proximity printing: x# Longer mask life. x# Typical separation range: 2.0-25 P m. x# Resolution: gap s of 10-15 P m limits the minimum feature size to 2-3 P m. Projecting printing: x# Numerical aperture: NA=sin D = R/D I R- radius of the exit pupil. D- distance from this pupil to the image plane x# Resolution: 0.6 O /sin D x# Rayleith’s criterionRayleith’s depth of focus: r O /(2 sin 2 D ) x# Minimum feature size: V = k O /NA k: proportionality factor. For a diffraction-limited system, k=0.5
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